Semes Co., Ltd.

Raetaek Oh

Hyunwoo Lee

Junghwan Lee

Jaeyong Kim

Taekyoub Lee

Disclosed are an apparatus and a method for treating a substrate. The substrate treating apparatus includes a flow rate measuring unit includes a container located outside the housing and having an accommodation space an upper side of which is opened and in which the treatment liquid discharged from the treatment liquid nozzle is accommodated, in the interior thereof, a measurement member configured to measure an amount of the treatment liquid accommodated in the accommodation space, and a drain line through which the treatment liquid in the container is discharged.

Substrate treating apparatus, method for measuring discharge amount by using the same, and substrate treating method

Disclosed is a substrate treating system. The substrate treating system includes an index unit having a port, on which a container containing a substrate is positioned, and an index robot, a process executing unit having substrate treating apparatuses for treating the substrate and a main transferring robot for transferring the substrate, and a buffer unit disposed between the process executing unit and the index unit and in which the substrate fed between the process executing unit and the index unit temporarily stays. Each of the index robot, the substrate treating apparatuses, the main transferring robot, and the buffer unit includes a conductive part contacting the substrate to remove static electricity of the substrate.

Substrate treating system

Disclosed is an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate, and a treatment liquid supply unit that supplies a treatment liquid to the substrate, and the treatment liquid supply unit includes an injection unit that supplies the treatment liquid to the substrate supported by the support unit, a tank that accommodates the treatment liquid, a pipe connected to the tank, and a static electricity removing member that removes static electricity from the treatment liquid.

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Chungcheongnam-do, South Korea

Raetaek Oh