Cymer, Inc.

R Mark Johnson

William N Partlo

Igor Vladimirovich Fomenkov

Richard M Ness

Oleh V Khodykin

Norbert R Bowering

Timothy S Dyer

I Roger Oliver

Curtis L Rettig

Jerzy R Hoffman

Rodney D Simmons

Stephan T Melnychuk

Gerry M Blumenstock

The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Extreme ultraviolet light source

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Ramona, CA, United States of America

R Mark Johnson