Xintec Corporation

Other

National Chung Shan Institute of Science and Technology

Po-Han Lee

Yen-Shih Ho

Tsang-Yu Liu

Wei-Ming Chien

Chia-Sheng Lin

Shu-Ming Chang

Chia-Ming Cheng

Wei-Luen Suen

Chia-Lun Tsai

Chien-Hung Liu

Wei-Ming Chen

Wen-Cheng Chien

Yi-Ming Chang

Hui-Hsien Wu

Chien-Min Lin

Hsiao-Lan Yeh

Jyun-Liang Wu

Ying-Nan Wen

Yu-Lung Huang

Chang-Sheng Hsu

Wei-Chung Yang

Jiun-Yen Lai

Chuen-Ming Gee

Ming-Chung Chung

Bo-Wen Chen

Kuan-Jung Wu

Biing-Jyh Weng

Hsin-Yen Lin

Yi-Rong Ho

A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate having a first surface and a second surface opposite thereto. A gallium nitride (GaN)-based device layer is formed on the first surface of the semiconductor substrate and has source, drain, and gate contact regions. First, second, and third through-substrate vias (TSVs) pass through the semiconductor substrate and are respectively electrically connected to the source, drain, and gate contact regions. An insulating liner layer is formed on the second surface of the semiconductor substrate and extends into the semiconductor substrate to separate the second and third TSVs from the semiconductor substrate. A semiconductor package assembly including the semiconductor device structure is also provided.

Semiconductor device structure and semiconductor package assembly

A manufacturing method of a chip package includes forming a temporary bonding layer on a carrier; forming an encapsulation layer on a top surface of a wafer or on the temporary bonding layer; bonding the carrier to the wafer, in which the encapsulation layer covers a sensor and a conductive pad of the wafer; patterning a bottom surface of the wafer to form a through hole, in which the conductive pad is exposed through the through hole; forming an isolation layer on the bottom surface of the wafer and a sidewall of the through hole; forming a redistribution layer on the isolation layer and the conductive pad that is in the through hole; forming a passivation layer on the isolation layer and the redistribution layer; and removing the temporary bonding layer and the carrier.

Manufacturing method of chip package

A chip package includes a semiconductor substrate, a supporting element, an antenna layer, and a redistribution layer. The semiconductor substrate has an inclined sidewall and a conductive pad that protrudes from the inclined sidewall. The supporting element is located on the semiconductor substrate, and has a top surface facing away from the semiconductor substrate, and has an inclined sidewall adjoining the top surface. The antenna layer is located on the top surface of the supporting element. The redistribution layer is located on the inclined sidewall of the supporting element, and is in contact with a sidewall of the conductive pad and an end of the antenna.

Chip package and manufacturing method thereof

A chip package includes a chip and a conductive structure. A first surface of the chip has a photodiode. A second surface of the chip facing away from the first surface has a recess aligned with the photodiode. The conductive structure is located on the first surface of the chip.

A chip package includes a high voltage withstanding substrate and a device chip. The high voltage withstanding substrate has a main body, a functional layer, and a grounding layer. The main body has a top surface, a bottom surface opposite the top surface, a through hole through the top surface and the bottom surface, and a sidewall surrounding the through hole. The functional layer is located on the top surface. The grounding layer covers the bottom surface and the sidewall. The device chip is located on the functional layer, and has a grounding pad that faces the main body. The grounding pad is electrically connected to the grounding layer in the through hole.

Chip package and power module

A chip package includes a chip, a sidewall structure that has a first light-shielding layer, a second light-shielding layer, and a cover. The chip has a light emitter and a light receiver that are located on a top surface of the chip. The sidewall structure is located on the top surface of the chip and has two aperture areas. The light emitter and the light receiver are respectively located in the two aperture areas. The sidewall structure surrounds the light emitter and the light receiver, and at least one surface of the sidewall structure has the first light-shielding layer. The second light-shielding layer is located between the chip and the sidewall structure. The cover is located on a surface of the sidewall structure facing away from the chip, and at least covers the light receiver and the sidewall structure that surrounds the light receiver.

The present invention provides an anode material of nano-silicon. The anode material has multilayer-graphene as a carrier and is coated with silicon suboxide and with an amorphous carbon layer. The anode material has multilayer-graphene to serve as a carrier, nano-silicon which is adsorbed on the multilayer-graphene and both the multilayer-graphene and the nano-silicon serve as a core, silicon suboxide and the amorphous carbon layer to cover the multilayer-graphene and the nano-silicon, and a plurality of buffering holes which are disposed on the anode material to provide buffering space. An anode material of high quality is realized by coating multilayer-graphene which serves as a carrier of nano-silicon with silicon suboxide and with the amorphous carbon layer.

Anode material of nano-silicon having multilayer-graphene as carrier and coated with silicon suboxide and with amorphous carbon layer and method for fabricating the same

A chip package is provided. A first bonding structure is disposed on a first redistribution layer (RDL). A first chip includes a sensing region and a conductive pad that are adjacent to an active surface. The first chip is bonded onto the first RDL through the first bonding structure. The first bonding structure is disposed between the conductive pad and the first RDL. A molding layer covers the first RDL and surrounds the first chip. A second RDL is disposed on the molding layer and the first chip and is electrically connected to the first RDL. A second chip is stacked on a non-active surface of the first chip and is electrically connected to the first chip through the second RDL, the first RDL, and the first bonding structure. A method of forming the chip package is also provided.

Chip package and method for forming the same

A chip package including a substrate having an upper surface, a lower surface, and a sidewall surface that is at the edge of the substrate is provided. The substrate includes a sensor device therein and adjacent to the upper surface thereof. The chip package further includes light-shielding layer disposed over the sidewall surface of the substrate and extends along the edge of the substrate to surround the sensor device. The chip package further includes a cover plate disposed over the upper surface of the substrate and a spacer layer disposed between the substrate and the cover plate. A method of forming the chip package is also provided.

A chip package including a substrate that has a first surface and a second surface opposite thereto is provided. The substrate includes a chip region and a scribe line region that extends along the edge of the chip region. The chip package further includes a dielectric layer disposed on the first surface of the substrate. The dielectric layer corresponding to the scribe line region has a through groove that extends along the extending direction of the scribe line region. A method of forming the chip package is also provided.

A semiconductor structure includes a chip, a light transmissive plate, a spacer, and a light-shielding layer. The chip has an image sensor, a first surface and a second surface opposite to the first surface. The image sensor is located on the first surface. The light transmissive plate is disposed on the first surface and covers the image sensor. The spacer is between the light transmissive plate and the first surface, and surrounds the image sensor. The light-shielding layer is located on the first surface between the spacer and the image sensor.

Semiconductor structure and manufacturing method thereof

A chip package includes a chip, an adhesive layer, and a dam element. The chip has a sensing area, a first surface, and a second surface that is opposite to the first surface. The sensing area is located on the first surface. The adhesive layer covers the first surface of the chip. The dam element is located on the adhesive layer and surrounds the sensing area. The thickness of the dam element is in a range from 20 &#x3bc;m to 750 &#x3bc;m, and the wall surface of the dam element surrounding the sensing area is a rough surface.

A chip package includes a chip, a first adhesive layer, a second adhesive layer, and a protection cap. The chip has a sensing area, a first surface, a second surface that is opposite to the first surface, and a side surface adjacent to the first and second surfaces. The sensing area is located on the first surface. The first adhesive layer covers the first surface of the chip. The second adhesive layer is located on the first adhesive layer, such that the first adhesive layer is between the first surface and the second adhesive layer. The protection cap has a bottom board and a sidewall that surrounds the bottom board. The bottom board covers the second adhesive layer, and the sidewall covers the side surface of the chip.

A semiconductor structure includes a silicon substrate, a protection layer, an electrical pad, an isolation layer, a redistribution layer, a conductive layer, a passivation layer, and a conductive structure. The silicon substrate has a concave region, a step structure, a tooth structure, a first surface, and a second surface opposite to the first surface. The step structure and the tooth structure surround the concave region. The step structure has a first oblique surface, a third surface, and a second oblique surface facing the concave region and connected in sequence. The protection layer is located on the first surface of the silicon substrate. The electrical pad is located in the protection layer and exposed through the concave region. The isolation layer is located on the first and second oblique surfaces, the second and third surfaces of the step structure, and the tooth structure.

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Taipei, Taiwan

Po-Han Lee