Taiwan Semiconductor Manufacturing Comp. Ltd.

Ping-Ling Fan

Chi-Wei Chang

Te-Hsiang Liu

Embodiments of mechanisms of an etching apparatus are provided. The etching apparatus includes a processing chamber. The etching apparatus also includes a gas distribution plate disposed in the processing chamber and comprising a number of exhaust openings. The etching apparatus further includes a number of end-point detectors disposed on the gas distribution plate. The gas distribution plate is configured to spurt gas into the processing chamber via the exhaust openings during a semiconductor process.

Mechanisms for etching apparatus and etching-detection method

An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.

Growing community of inventors

Zhudong, Taiwan

Ping-Ling Fan