The Boc Group, Inc.

Peter Harold Buckley

Richard A Hogle

Graham Hodgson

David W Birch

Kenneth William Cross

Jack B Wert

Noel James Leeson

Kazuya Inoue

A method and system for thermally activating a oxidizing cleaning gas for use in a semiconductor process chamber cleaning process. The oxidizing cleaning gas is thermally activated by reacting the oxidizing cleaning gas with heated inert gas. The resulting thermally activated oxidizing cleaning gas does not readily deactivate, thus providing enhanced cleaning capabilities.

Thermal activation of fluorine for use in a semiconductor chamber

A valve for use with an ultra high purity gas comprising a valve body defining a valve chamber having a valve outlet through which gas is discharged and containing a reciprocable sealing member, characterized in that the valve chamber is in fluid communication with a source of the gas and in that the sealing member is reciprocable along an axis substantially parallel to the direction of flow of gas discharged from the valve outlet and into and out of sealing contact with a sealing face located within the valve chamber and circumscribing the inlet end of a valve outlet pipe, the opposite, outlet end of which pipe forms the valve outlet. The valve has a low wetted area and is thus easy to purge, and the valve design both reduces wear and restricts it to a single component which is easily replaced when necessary.

Valve for use with high purity gas

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Salem, NH, United States of America

Peter Harold Buckley