Taiwan Semiconductor Manufacturing Comp. Ltd.

Peng Shen

Chung-Wei Chang

Bi-Ming Yen

Ping-Jung Huang

Bo-Wei Chou

Chin-Ming Lin

Pi-Chun Yu

Embodiments of the present disclosure relates to a wet bench processing including an in-situ pre-treatment prior to performing the first set of wet bench operations. The pre-treatment may include a pre-clean operation and/or a pre-heat operation. The pre-treatment may be performed in one of the existing ONB tanks without requiring adding new tanks to an existing wet bench tool. The pre-clean operation removes particles from a batch of wafers to avoid or reduce cross-contamination and defect issues, thus improving the yield rate of the wet bench process. The pre-heat operation provides better control and stabilize the temperature in the CHB tank to stabilize the process, such as to stabilize an etch rate.

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Taoyuan, Taiwan

Peng Shen