Taiwan Semiconductor Manufacturing Comp. Ltd.

Pei-Fen Chou

Szu-An Wu

Yi-Lung Cheng

Wen-Kung Cheng

Chin-Kai Liu

Jane-Bai Lai

Ming-Hwa Yoo

Ying-Long Wang

Jun-Yean Chiou

Han-Shun Lui

A method of forming a SIMS monitor device for determining a doping profile of a semiconductor device structure including providing a plurality of regularly repeating semiconductor structures including a doping profile to form a monitor device including at least one layer of the regularly repeating semiconductor structures; planarizing the monitor device through a thickness of the regularly repeating semiconductor structures to reveal a target surface overlying the doping profile to form a monitor pattern; and, sputtering the target surface over a sputtering area including the monitor pattern through a thickness thereof while simultaneously detecting and counting over a time interval at least one type of species ejected from the target surface according to a secondary ion mass spectroscopy procedure (SIMS).

Method and apparatus for determining two dimensional doping profiles with SIMS

A method of etching a low dielectric constant material with an aqueous solution of hydrofluoric acid and hydrochloric acid. The etching solution is particularly useful on low dielectric constant materials that are water repulsive or hydrophobic. The weight ratio of hydrofluoric acid to hydrochloric acid in the aqueous solution ranges from 1:3 to 4:1.

Method of wet etching low dielectric constant materials

A method of removing residual fluorine present in a HDP-CVD chamber which includes a high pressure seasoning process, a dry-cleaning process, and a low-pressure deposition process.

Method for removing residual fluorine in HDP-CVD chamber

Growing community of inventors

Hsin-Chu, Taiwan

Pei-Fen Chou