Kla Tencor Corporation

Paykin Irina

Vladimir Levinski

Daniel Kandel

Yoel Feler

Noam Sapiens

Barak Bringoltz

Alexander Svizher

Meir Aloni

Guy Ben Dov

Hadar Shalmoni

Amnon Manassen

Daria Negri

Ohad Bachar

Boris Golovanevsky

Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.

Symmetric target design in scatterometry overlay metrology

Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

Phase characterization of targets

Growing community of inventors

Haifa, Israel

Paykin Irina