Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Payam Tayebati

Markus Hauf

Hubert Holderer

Jochen Weber

Arif Kazi

Toralf Gruner

Jens Kugler

Bernhard Gellrich

Stefan Hembacher

Ulrich Schoenhoff

Thomas Ittner

Alexander Sauerhoefer

Michael Thier

Ole Fluegge

Gerhard Focht

Karl-Heinz Schimitzek

Boris Bittner

Sascha Bleidistel

Eric Eva

Olaf Conradi

Wolfgang Hummel

Baerbel Schwaer

Aksel Goehnermeier

Dirk Hellweg

Tilmann Heil

An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

Optical imaging device with thermal attenuation

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Optical correction device

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Projection objective of a microlithographic projection exposure apparatus

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Ulm, Germany

Payam Tayebati