Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Paul Kaufmann

Rolf Freimann

Bernhard Geuppert

Ulrich Mueller

Joachim Stuehler

Oswald Gromer

Hartmut M&uuml;nker

Armin Sch&ouml;ppach

A projection exposure system () for microlithography which includes: a mask holding device () holding a mask () with mask structures () disposed on the mask, a substrate holding device () holding a substrate (), projection optics () imaging the mask structures () onto the substrate () during an exposure process, and a measurement structure () disposed in a defined position with respect to a reference element () of the projection exposure system (), which defined position is mechanically uncoupled from the position of the mask holding to device (). The projection exposure system () also includes a detector () arranged to record an image of the measurement structure () imaged by the projection optics (). The projection exposure system () is configured such that during operation of the projection exposure system () the imaging of the mask structures () and the imaging of the measurement structure () take place at the same time by the projection optics (. An evaluation device () is configured to establish a lateral position of the image of the measurement structure () in the area of the detector () during the exposure process.

Projection exposure system for microlithography with a measurement device

A projection exposure system () for microlithography which includes: a mask holding device () holding a mask () with mask structures () disposed on the mask, a substrate holding device () holding a substrate (), projection optics () imaging the mask structures () onto the substrate () during an exposure process, and a measurement structure () disposed in a defined position with respect to a reference element () of the projection exposure system (), which defined position is mechanically uncoupled from the position of the mask holding device (). The projection exposure system () also includes a detector () arranged to record an image of the measurement structure () imaged by the projection optics (). The projection exposure system () is configured such that during operation of the projection exposure system () the imaging of the mask structures () and the imaging of the measurement structure () take place at the same time by the projection optics (. An evaluation device () is configured to establish a lateral position of the image of the measurement structure () in the area of the detector () during the exposure process.

The invention relates to an optical bench that has a base plate and can be permanently connected to an associated component. A receiving element for other optical elements that is arranged in such a way in relation to the base plate with connecting elements that it is deformable in its entirety in relation to said base plate, is allocated to the same.

Optical bench

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Aalen, Germany

Paul Kaufmann