Cymer, Inc.

Nortbert Bowering

William N Partlo

Igor Vladimirovich Fomenkov

Xiaojiang Jason Pan

I Roger Oliver

Rodney D Simmons

Gerry M Blumenstock

An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.

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San Diego, CA, United States of America

Nortbert Bowering