Applied Materials Israel Limited

Carl Zeiss Microscopy Gmbh

Carl Zeiss Smt Gmbh

Nissim Elmaliah

Rainer K Knippelmeyer

Thomas Kemen

Stefan Schubert

Steven Robert Rogers

Dirk Zeidler

Emanuel Elyasaf

Mario Muetzel

Steven R Rodgers

A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Focusing a charged particle system

A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.

Charged particle multi-beam inspection system and method of operating the same

A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Focusing a charged particle imaging system

A high-throughput inspection system and method. The system includes: (i) a charged particles to light converter adapted to convert a secondary array of charged particle beams to a first array of light beams; wherein the first array of light beams is characterized by a first ratio of an average first array light beam diameter to an average distance between adjacent first array light beams of the first array; (ii) first optics, positioned between the charged particles to light converter and between inputs of multiple fibers, wherein the first optics is adapted to provide a second array of light beams; wherein each second array light beam corresponds to a first array light beam; wherein the second array of light beams is characterized by a second ratio of an average second array light beam diameter to an average distance between adjacent second array light beams; wherein the second ratio is substantially smaller than the first ratio; (iii) multiple fibers that are adapted to direct second array light beams towards multiple detectors; wherein the inputs of the multiple fibers are positioned in response to an expected spatial disorder of the second array of light beams and to diameters of second array light beams; and (iv) multiple detectors, adapted to detect light from the multiple fibers.

High throughput multi beam detection system and method

Growing community of inventors

Raanana, Israel

Nissim Elmaliah