Hitachi Chemical Company, Ltd.

Naoko Tomoda

Toshiyasu Kawai

Yoshiyuki Tanabe

Tomohiro Nagoya

Kiyohide Tateoka

The object of the present invention is to provide an adhesion film for semiconductor that is capable of bonding a semiconductor chip to a lead frame tightly at an adhesion temperature lower than that of the adhesion film of a traditional polyimide resin without generation of voids and that can also be used for protection of lead frame-exposed area, a thermoplastic resin composition for semiconductor for use in the adhesive agent layer therein, and a lead frame having the adhesive film and a semiconductor device; and, to achieve the object, the present invention provides a thermoplastic resin composition for semiconductor, comprising a thermoplastic resin obtained in reaction of an amine component containing an aromatic diamine mixture (A) containing 1,3-bis(3-aminophenoxy)benzene, 3-(3'-(3&#x2033;-aminophenoxy)phenyl)amino-1-(3&#x2032;-(3&#x2033;-aminophenoxy)phenoxy)benzene and 3,3&#x2032;-bis(3&#x2033;-aminophenoxy)diphenylether, and an acid component (C), an adhesion film for semiconductor using the same, a lead frame having the adhesion film and a semiconductor device using the same.

Thermoplastic resin composition for semiconductor, adhesion film, lead frame, and semiconductor device using the same, and method of producing semiconductor device

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Ichihara, Japan

Naoko Tomoda