Canon Anelva Corporation

Nikon Corporation

Sapporo Medical University

Naoki Watanabe

David Djulianto Djayaprawira

Einstein Noel Abarra

Tatsuo Amanuma

Koji Tsunekawa

Yoshiaki Ohtsubo

Motonobu Nagai

Toru Kitada

Yasumi Kurematsu

Hiroshi Wakabayashi

Hideya Inoue

Akira Katayama

Hideki Ito

Shinji Furukawa

Toru Kosaka

Hiroki Maehara

Nobuo Yamaguchi

Yoshinori Nagamine

Yoshimitsu Kodaira

Tomotaka Shinoda

Masahiro Suenaga

Jun Nagai

Motomu Kosuda

Takeo Konno

Hiroyuki Hosoya

Satoshi Mori

Toshihiro Mitaka

Disclosed is a sputtering apparatus having a target () disposed offset with respect to a substrate (), wherein the uniformity of a deposition amount can be ensured even when a substrate support holder () has a low number of rotations of several rotations to several tens of rotations and the amount of deposition is extremely small to provide such a film thickness of 1 nm or less. A control unit () is provided to control a rotational velocity V (rps) of the substrate support holder () to satisfy:by inputting the value of a deposition time T and the values of a total whole number of rotations N and a fractional number of rotations &#x3b1; which are expressed as:X=N+&#x3b1;

Sputtering apparatus and recording medium for recording control program thereof

A magnetic film having excellent uniformity in in-plane distribution of film thickness or sheet resistance is formed when the film is formed by forming a magnetic field on a processing surface of a substrate () and performing oblique incidence sputtering by using high discharge power. A sputtering apparatus () is provided with a substrate holder () for holding rotatably the substrate () in the surface direction of the processing surface of the substrate; a substrate magnetic field forming device () which is disposed to surround the substrate () and forms a magnetic field on the processing surface of the substrate (); cathodes () which are arranged diagonally above the substrate () and are supplied with electric discharge power; a position detecting device () for detecting a rotation position of the substrate (); and a control device () which adjusts the rotation speed of the substrate () in accordance with the rotation position detected by the position detecting device ().

Sputtering device and sputtering method

The magnetic anisotropy of a magnetic layer in a spin valve tunnel magnetoresistive element or giant magnetoresistive element is enhanced. Deposition of the magnetic layer is performed by making sputtering particles obliquely incident on a substrate from a certain incident direction at a certain incident angle.

Method of manufacturing magnetoresistive element, sputter deposition chamber, apparatus for manufacturing magnetoresistive element having sputter deposition chamber, program and storage medium

A sputtering apparatus includes a substrate holder which holds a substrate to be rotatable in the plane direction of the processing surface of the substrate, a substrate-side magnet which is arranged around the substrate and forms a magnetic field on the processing surface of the substrate, a cathode which is arranged diagonally above the substrate and receives discharge power, a position detection unit which detects the rotational position of the substrate, and a controller which controls the discharge power in accordance with the rotational position detected by the position detection unit.

Sputtering apparatus, sputtering method, and electronic device manufacturing method

Disclosed are method and apparatus for manufacturing a magnetoresistive device which are suitable for manufacturing a high-quality magnetoresistive device by reducing damages caused during the processing of a multilayer magnetic film as a component of the magnetoresistive device, thereby preventing deterioration of magnetic characteristics due to such damages. Specifically disclosed is a method for manufacturing a magnetoresistive device, which includes processing a multilayer magnetic film by performing a reactive ion etching on a substrate which is provided with the multilayer magnetic film as a component of the magnetoresistive device. This method for manufacturing a magnetoresistive device includes irradiating the multilayer magnetic film with an ion beam after the reactive ion etching.

Method and apparatus for manufacturing magnetoresistive devices

An inspection apparatus includes an imaging device and an image processing device. The imaging device photographs a specimen and outputs a color image of the specimen to the image processing device. The image processing device subjects the color image of the specimen to negative-positive reversal. After detecting a mode value of the hue the color image having been subjected to negative-positive reversal, the image processing device changes the hue of the color image in accordance with a difference between a boundary value of two predefined hues and the detected mode value. In accordance with the change of the hue, a plurality of target pixels different in the saturation is extracted and the saturation and the intensity of each pixel are changed, or the gradation of each pixel is converted so that the plurality of target pixels becomes most distant from one another in a color space.

Image processing device and recording medium storing image processing program

There are comprised a load chamber () for carrying in a wafer from outside, an unload chamber () for carrying out a wafer to outside, and a plurality of conveyance chambers () and a plurality of process modules () connected in series between the load chamber and the unload chamber. The conveyance chambers and the process modules are connected alternately and the plurality of conveyance chambers includes a first end conveyance chamber () connected to the load chamber, a second end conveyance chamber () connected to the unload chamber, and another one or a plurality of intermediate conveyance chambers ().

Inline-type wafer conveyance device

A structure is provided in which a load lock chamber () for carrying in an unprocessed wafer from outside and carrying out a processed wafer to outside, a first end conveyance chamber () to be connected to the load lock chamber, at least one intermediate conveyance chamber (), a plurality of sets of a pair of process modules () provided adjacent to each other and capable of independent processing, and a second end conveyance chamber () disposed at the end part on the opposite side of the load lock chamber are connected in series. Each set of process modules (and) is arranged one by one between the first end conveyance chamber and the intermediate conveyance chamber, between the intermediate conveyance chambers, and between the intermediate conveyance chamber and the second end conveyance chamber, respectively.

An automatic-focus camera has a focus lock system that stores focus adjusting information so that a photo-taking lens may be kept focused on an object during one or more exposures. The camera has a self timer, an automatic exposure system with different program modes, and has continuous as well as single-frame operating modes. The focus lock system, which has different focus lock modes, influences the manner in which various operations of the camera are performed.

Operation control device for a camera

An electrically operated camera having a release means for effecting a shutter release action for the light exposure of film is capable of determining whether a film is loaded or not in the basis of the film feeding condition. A film feed detection means detects the action of a film being rewound by a film rewind means, and generates a signal upon detection. When a controller receives the signal during the film rewind action, the controller prevents the release means from effecting shutter release after the completion of the rewind action. When no signal is received during the rewind action, the controller permits the release means to effect shutter release after the completion of the rewind action. The action of the film feed condition may alternatively be detected when it is being wound by a film wind means. If it is determined that the camera is loaded with a film, release lock is effected so as to prevent the exposed frame from being subjected to any further exposure by the user. If a film unloaded state of the camera is determined, it can perform the release action, thereby facilitating the checking of its various actions.

Growing community of inventors

Kawasaki, Japan

Naoki Watanabe