Samsung Electronics Co., Ltd.

Myung Jun Lee

Sung Ho Jang

Wook Rae Kim

Jin Yong Kim

Kwang Soo Kim

Seung Woo Lee

Soon Yang Kwon

Kwang Rak Kim

Gwang Sik Park

Dae Hoon Han

Seo Yeon Jeong

Jang Ryul Park

An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.

Optical measurement apparatus, measuring method using the same, and method of fabricating semiconductor device using the same

A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.

Optical measurement apparatus, measuring method using the same, and method for fabricating semiconductor device using the same

A method for fabricating a semiconductor device is provided. The method includes: loading a substrate on a stage of an apparatus for inspecting the substrate; extracting a first light having a first wavelength from a light by using a light source; acquiring first position information on at least one focal point, formed on the substrate, based on the first wavelength by using a controller, the at least one focal point being a pre-calculated at least one focal point; adjusting a position of at least one from among an objective lens and at least one microsphere in a vertical direction by using the first position information in the controller; condensing the first light, which has passed through the at least one microsphere, on the at least one focal point formed on the substrate; and inspecting the substrate by using the first light condensed on the at least one focal point.

Apparatus for inspecting substrate and method for fabricating semiconductor device using the same

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Seongnam-si, South Korea

Myung Jun Lee