Carl Zeiss Smt Gmbh

Mohammad Awad

Jan Horn

Matthias Manger

Kerstin Hild

Michel Aliman

Lars Berger

Cornelius Richt

Jochen Knopf

A drive device includes: a drive unit configured to apply a drive voltage to a capacitive actuator to set a position of a capacitive actuator; a source controllable by an excitation signal and coupled to the first node to feed a time-dependent AC current signal into the first node so that an AC voltage arises at the capacitive actuator due to a superposition of the drive voltage and an AC voltage corresponding to a product of the AC current signal and an impedance of the capacitive actuator; a filter unit connected configured to filter an output signal of the capacitive actuator; and a determining unit configured to determine an impedance behaviour of the capacitive actuator depending on the filtered output signal, the determining unit configured to output the excitation signal to drive the source.

Drive device, optical system and lithography apparatus

A mirror including a substrate (), a reflection layer system (), and at least one continuous piezoelectric layer (, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer () setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (, . . . ) that are electrically insulated from one another.

Mirror, in particular for microlithography

A modulation device includes: a signal splitter configured to generate: i) an M-bit wide partial signal comprising M more significant bits of an N-bit wide input signal; and ii) an L-bit wide partial signal comprising L less significant bits of the N-bit wide input signal, where L=N−M; a first modulation unit configured to generate a 1-bit wide pulse density modulation signal on the basis of the L-bit wide partial signal; a summation unit configured to generate an M-bit wide summation signal on the basis of the M-bit wide partial signal and the 1-bit wide pulse density modulation signal; and a second modulation unit configured to generate a 1-bit wide pulse width modulation signal on the basis of the M-bit wide summation signal.

Modulation device, control device, optical system, lithography system and method

The disclosure provides a method and an apparatus for modifying imaging properties of a microlithographic optical system. In a method according to the disclosure, the imaging properties are modified by way of control signals coupled into the optical system by way of at least one interface. The values of the control signals that are in each case coupled in during the controlling for a desired modification of the imaging properties are ascertained on the basis of a model. The model is created by virtue of performing, in a learning phase in which the modification of the imaging properties that is in each case attained for different values of the control signals is ascertained, a successive individual adaptation of the model to the optical system. The learning phase is performed without prior specification of explicit information relating to internal mechanisms of action within the optical system.

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Heidenheim, Germany

Mohammad Awad