Tokyo Electron Limited

Hitachi, Ltd.

Adeka Corporation

Hitachi Maxell, Limited

Maxell, Ltd.

Hitachi Consumer Electronics Co., Ltd.

Hitachi Information & Telecommunication Engineering, Ltd.

Mitsuhiro Okada

Kazuhide Hasebe

Akifumi Suzuki

Koichi Shigeno

Yoshikazu Furusawa

Kazuya Takahashi

Toru Yano

Hironori Komi

Katsuhiko Komori

Satoshi Takagi

Akinobu Kakimoto

Toshiharu Nishimura

Hiroki Mizosoe

Yusuke Yatabe

Satoshi Morishita

Daisuke Suzuki

Jun Ogawa

Keisuke Inata

Pao-Hwa Chou

Yamato Tonegawa

Hiroyuki Hayashi

Yukio Tojo

Keisuke Fujita

Chaeho Kim

Satoru Watanabe

Masahiro Shinkai

Katsuyuki Nakamura

Yoshiki Kurokawa

Yohei Aoyama

Shimpei Nomura

Masahisa Watanabe

Atsushi Monden

Takayuki Akiyama

Yasushi Fujii

Tomoyuki Ariyoshi

Tatsuya Miyahara

Takehiro Niikura

Junji Tanabe

Satoshi Mizunaga

Tomoyuki Myojin

Kyohei Unno

Yusuke Kubota

Hiroki Ohashi

Yoshitaka Tsujimoto

Takuto Sato

Sheraz Ahmed

Mohammad Osamh Adel Al-Naser

Akira Yamamoto

Hiroshi Kojima

Takayuki Suzuki

Keisuke Hatasaki

Keisuke Suzuki

Tatsuya Yamaguchi

Manabu Sasamoto

Jun Sato

Atsushi Endo

Kohei Fukushima

Yoshinobu Hayakawa

Nobuhiro Takahashi

Taku Nakamura

Koji Yoshii

Takehiko Fujita

Yutaka Motoyama

Tsuyoshi Takahashi

Masahiko Tomita

Kazumi Kubo

Yoshifumi Fujikawa

Kazuo Kibi

Akitake Tamura

Takahiro Miyahara

Toshiki Takahashi

Yu Nunoshige

Takashi Chiba

Toshio Takagi

Yosuke Maeda

Tetsuro Honmura

Ryou Son

Toshihiko Takahashi

Rui Kanemura

Yoshimasa Kashihara

Satoshi Onodera

Hirotaka Kuwada

Yuichiro Aoki

Yasuhiro Hamada

Yukiko Kanehara

Masafumi Shoji

Toshikazu Yanagihara

Yukiko Mae

Kazuya Kitamura

Shinji Kawasaki

Kenji Suzuki

Naoya Nishio

Hiromasa Yonekura

Masaru Nagai

Byounghoon Lee

Hiromichi Kotsugai

Shigetsugu Fujita

Kazuki Yano

A method of manufacturing a semiconductor device includes: planarizing a surface of a substrate having a conductive material embedded in a first hole so as to expose the conductive material embedded in the first hole, wherein the first hole is formed in a region which is on an insulating film laminated on the substrate and is surrounded by a spacer film; laminating a mask film on the surface of the substrate; forming a second hole in the mask film such that at least a portion of an upper surface of the conductive material embedded in the first hole is exposed; embedding the conductive material in the second hole; and removing the mask film.

Method of manufacturing semiconductor device

A substrate processing method in substrate processing apparatus comprises repeating cycle including: supplying source gas into process container causing the source gas to be adsorbed to substrate; exhausting excess source gas from the process container; supplying reaction gas into the process container causing the reaction gas to react with the source gas; and exhausting excess reaction gas, wherein at least one of a gap width between placement stage and member forming processing space between the member and the stage and degree of opening of pressure adjustment valve in at least one of the supplying the source gas and the supplying the reaction gas is smaller than at least one of a gap width between the stage and the member and the degree of opening of the pressure adjustment valve in at least one of the exhausting the excess source gas and the exhausting the excess reaction gas, respectively.

Substrate processing method and substrate processing apparatus

To be capable of efficiently transmitting appropriate information on the motion improvement to a person in motion. A motion evaluation system includes a sensor unit, an information processing device, and an information presentation device. The information processing device includes a communication device, a storage device, and an arithmetic device. The arithmetic device acquires motion data acquired by observing a user through the use of a sensor via the communication device, checks the motion data against information about the correctness of motions in the reference information, determines a state of motion of the user, specifies a motion in a state to be improved as an improvement, check the motion data after the motion corresponding to the improvement against information about busy levels of the user to specify a busy level of the user, and outputs, as improvement suggestion information about the improvement, information with different contents at each of multiple times to an information presentation device based on the improvement and a rule predetermined according to each situation of the busy level.

Motion evaluation system, motion evaluation device, and motion evaluation method

There is provided a method of forming a silicon film, which includes: a film forming step of forming the silicon film on a base, the silicon film having a film thickness thicker than a desired film thickness; and an etching step of reducing the film thickness of the silicon film by supplying an etching gas containing bromine or iodine to the silicon film.

Silicon film forming method and substrate processing apparatus

According to one embodiment of the present disclosure, there is provided a substrate processing method including: providing a substrate; forming a seed layer on a surface of the substrate by heating a stage on which the substrate is placed to a first temperature and supplying a first source gas to the substrate; and forming a metal-containing film by heating the stage on which the substrate is placed to a second temperature and supplying a second source gas and a first reducing gas to the substrate on which the seed layer is formed.

A work support system is capable of avoiding situations where a worker performs erroneous work. The system includes an identification unit which identifies a target of an inquiry from a worker based on a video acquired by an imaging device, a selection unit which selects determination model information corresponding to each of one or more targets of inquiry identified by the identification unit from a storage unit storing determination model information to be used in a determination model. A determination unit determines whether each of the targets of inquiry is correct by using each of the determination models in which the determination model information, which was selected by the selection unit, corresponding to each of the one or more targets of inquiry identified by the identification unit, has been set in the determination model. An output unit outputs a determination result of the determination unit.

Work support system and work support method

Provided is a heat insulation structure used for a vertical heat treatment apparatus that performs a heat treatment on a substrate. The vertical heat treatment apparatus includes: a processing container having a double tube structure including an inner tube and an outer tube closed upward, the processing container having an opening at a lower end thereof; a gas supply section and exhaust section provided on a lower side of the processing container; a lid configured to introduce or discharge the substrate into or from the opening and to open/close the opening; and a heating section provided to cover the processing container from an outside. The heat insulation structure is provided between the inner tube and the outer tube.

Heat insulation structure at lower end of vertical heat treatment apparatus and vertical heat treatment apparatus including heat insulation structure thereof

There is provided a film forming method comprising an organic substance removal step of removing an organic substance adhering to an oxide film generated on a surface of a base by supplying a hydrogen-containing gas and an oxygen-containing gas to the base; an oxide film removal step of removing the oxide film formed on the surface of the base after the organic substance removal step; and a film forming step of forming a predetermined film on the surface of the base after the oxide film removal step.

Film forming method and substrate processing apparatus

The present invention is provided to notify a person who makes a movement of a part to be improved in the movement. A movement evaluation system includes: a proficiency degree estimating unit generating a proficiency degree score on the basis of movement data obtained by detecting a movement of a user; an improvement point extracting unit specifying a part of the movement of the user as an improvement point on the basis of the movement data; and an information generating unit generating suggestion information to be presented to the user, on the basis of the improvement point.

Movement evaluation system and method

A storage unit includes a plurality of storage devices that form a RAID group, that are coupled to the same bus, and that communicate with each other. Each of the plurality of storage devices includes a device controller and a storage medium. The plurality of storage devices store each of data and parities generated on the basis of the data, the data and the parities being included in RAID stripes. A first device controller of a first storage device included in the RAID group transmits, to the plurality of storage devices included in the RAID group other than the first storage device, an instruction to transfer the data and/or the parities included in the RAID stripes and restores the data or the parity corresponding to the first storage device of the RAID stripes on the basis of the transferred data and the transferred parities.

Storage unit and storage device

There is provided a cleaning method of a film forming apparatus in which a process of forming a silicon film, a germanium film or a silicon germanium film on a substrate mounted on a substrate holder in a processing container is performed, comprising: etching away the silicon film, the germanium film or the silicon germanium film adhered to an interior of the processing container including the substrate holder by supplying a halogen-containing gas not containing fluorine into the processing container in a state where the substrate holder, which was stored in a dew point-controlled atmosphere after the film forming process, is accommodated in the processing container with no substrate being mounted thereon.

Cleaning method and film forming method

There is provided a film forming apparatus for performing a film forming process on substrates by heating the substrates while the substrates are held in a shelf shape by a substrate holder in a vertical reaction container. The film forming apparatus includes: an exhaust part configured to evacuate the reaction container; a gas supply part configured to supply a film forming gas into the reaction container; a heat insulating member provided above or below an arrangement region of the substrates to overlap with the arrangement region and configured to thermally insulate the arrangement region from an upper region above the arrangement region or a lower region below the arrangement region; and a through-hole provided in the heat insulating member at a position overlapping with central portions of the substrates to adjust a temperature distribution in a plane of each substrate held near the heat insulating member.

Film forming apparatus, film forming method and heat insulating member

Reduction in power consumption is not considered in the prior art documents. Provided is an encoding method for encoding image information and having: a step in which image information is input; an analysis step in which the characteristics of the input image information are analyzed; a bit depth output step in which the bit depth for video encoding is determined and output; and an encoding step in which the bit depth output in the bit depth output step is used and the input image information is encoded. The encoding method is characterized by the output bit depth being switched in the bit depth output step, on the basis of the analysis results from the analysis step.

Encoding method and encoding device

A management controller controls a data buffer and a flash controller, which controls I/O of data to and from flash memories, based on a search request. A data decompression engine includes a plurality of data decompression circuits for decompressing, in parallel, the compressed data transferred from the data buffer. A data search engine includes a plurality of data search circuits for searching, in parallel, data which satisfies search conditions among the respective data that were decompressed by the data decompression circuits, and transfers, to the search request source, the data obtained in the search performed by the data search circuits, wherein the flash controller reads, in parallel, a plurality of compressed data requested in the search request, and transfers the read compressed data to the data buffer, and the management controller transfers the compressed data to the data decompression engine when the compressed data is stored in the data buffer.

Storage apparatus, data processing method and storage system wherein compressed data is read in parallel, said data stored in buffer by size and read from said buffer, in order of when said data is stored in said buffer

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Nirasaki, Japan

Mitsuhiro Okada