United Microelectronics Corp.

Ming-Tse Lin

Chun-Hung Chen

Chien-Li Kuo

Yung-Chang Lin

Chu-Fu Lin

Kuei-Sheng Wu

Chung-Hsing Kuo

Chun-Ting Yeh

Hui-Ling Chen

Chung-Sung Jang

Zhirui Sheng

Chien En Hsu

Sun-Chieh Chien

Chien-Ming Lai

Teng-Chuan Hu

Chia-Fang Lin

A structure of semiconductor device is provided, including a first circuit structure, formed on a first substrate. A first test pad is disposed on the first substrate. A second circuit structure is formed on a second substrate. A second test pad is disposed on the second substrate. A first bonding pad of the first circuit structure is bonded to a second bonding pad of the second circuit structure. One of the first test pad and the second test pad is an inner pad while another one of the first test pad and the second test pad is an outer pad, wherein the outer pad surrounds the inner pad.

Structure of semiconductor device

A semiconductor structure includes an interposer substrate, an electronic device formed in a device region of the interposer substrate, a guard ring formed in the interposer substrate and surrounding the device region, a first redistribution layer on an upper surface of the interposer substrate and covering the device region and the guard ring, and a chip disposed on the first redistribution layer and overlapping the device region.

Semiconductor structure

A semiconductor structure includes an interposer substrate having an upper surface, a lower surface opposite to the upper surface, and a device region. A first redistribution layer is formed on the upper surface of the interposer substrate. A guard ring is formed in the interposer substrate and surrounds the device region. At least a through-silicon via (TSV) is formed in the interposer substrate. An end of the guard ring and an end of the TSV that are near the upper surface of the interposer substrate are flush with each other, and are electrically connected to the first redistribution layer.

A semiconductor device, including a first semiconductor substrate and a second semiconductor substrate, is provided. A first bonding structure is located on the first semiconductor substrate and includes a first pad having an elongated shape. A second bonding structure is located on the second semiconductor substrate and includes a second pad having an elongated shape. The first semiconductor substrate is bonded to the second semiconductor substrate by bonding the first bonding structure and the second bonding structure. The first pad is bonded to the second pad, and an extension direction of the first pad is different from an extension direction of the second pad.

Semiconductor device including elongated bonding structure between the substrate

Structure of semiconductor device and method for bonding two substrates

A semiconductor structure is disclosed. The semiconductor structure includes an interposer substrate having an upper surface and a lower surface that is opposite to the upper surface. A guard ring is formed in the interposer substrate and surrounds a device region of the interposer substrate. At least a through-silicon via is formed in the interposer substrate. An end of the guard ring and an end of the through-silicon via that are near the upper surface of the interposer substrate are flush with each other.

A package structure of a semiconductor device includes a first substrate, a second substrate, and a bonding layer. The bonding layer bonds the first substrate and the second substrate. The bonding layer includes an inner bonding pad pattern and an outer bonding pad pattern formed in a dielectric layer. The outer bonding pad pattern surrounds the inner bonding pad pattern. A first bonding pad density of the outer bonding pad pattern is greater than a second bonding pad density of the inner bonding pad pattern.

Package structure of semiconductor device with improved bonding between the substrates

A structure of semiconductor device is provided. The structure includes a first bonding pattern, formed on a first substrate. A first grating pattern is disposed on the first substrate, having a plurality of first bars extending along a first direction. A second bonding pattern is formed on a second substrate. A second grating pattern, disposed on the second substrate, having a plurality of second bars extending along the first direction. The first bonding pattern is bonded to the second bonding pattern. One of the first grating pattern and the second grating pattern is stacked over and overlapping at the first direction with another one of the first grating pattern and the second grating pattern. A first gap between adjacent two of the first bars is different from a second gap between adjacent two of the second bars.

A semiconductor package structure and a method for forming the same are disclosed. The semiconductor package structure includes a semiconductor die, a molding layer and an inductor. The semiconductor die includes an active surface, a back surface and a sidewall surface between the active surface and the back surface. The molding layer covers the back surface and the sidewall surface of the semiconductor die. The inductor is in the molding layer. The sidewall surface of the semiconductor die faces toward the inductor.

Semiconductor package structure

Semiconductor package structure and method for forming the same

Provided are a three-dimensional integrated circuit (3DIC) and a method of manufacturing the same. The 3DIC includes a first wafer, a second wafer, and a hybrid bonding structure. The second wafer is bonded to the first wafer by the hybrid bonding structure. The hybrid bonding structure includes a blocking layer between a hybrid bonding dielectric layer and a hybrid bonding metal layer.

Three-dimensional integrated circuit and method of manufacturing the same

A TSV structure includes a substrate comprising at least a TSV opening formed therein, a conductive layer disposed in the TSV opening, and a bi-layered liner disposed in between the substrate and the conductive layer. More important, the bi-layered liner includes a first liner and a second liner, and a Young's modulus of the first liner is different from a Young's modulus of the second liner.

Through-silicon via structure

A chip-stack structure including a first chip and a second chip located on the first chip is provided. The first chip includes a first substrate, a first interconnect structure, a first pad, and a first contact conductor. The first interconnect structure is located on a first surface of the first substrate. The first pad is located on the first interconnect structure. The first contact conductor is located in the first substrate and exposed on a second surface of the first substrate opposite to the first surface. The second chip includes a second substrate, a second interconnect structure, a second pad, and a second contact conductor. The second interconnect structure is located on the second substrate. The second pad is located on the second interconnect structure. The second contact conductor is located in the second substrate, wherein the first contact conductor is directly physically in contact with the second pad.

Chip-stack structure

A semiconductor structure includes a substrate having a frontside surface and a backside surface. A through-substrate via extends into the substrate from the frontside surface. The through-substrate via comprises a top surface. A metal cap covers the top surface of the through-substrate via. A plurality of cylindrical dielectric plugs is embedded in the metal cap. The cylindrical dielectric plugs are distributed only within a central area of the metal cap. The central area is not greater than a surface area of the top surface of the through-substrate via.

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Hsinchu, Taiwan

Ming-Tse Lin