Taiwan Semiconductor Manufacturing Comp. Ltd.

Ming-Sen Tung

Ru-Gun Liu

Li-Jui Chen

Tsai-Sheng Gau

Chun-Kuang Chen

Yung-Sung Yen

Chi-Cheng Hung

Tzung-Chi Fu

Wei-Liang Lin

Kuei-Shun Chen

Fu-Jye Liang

Meng-Wei Chen

The present disclosure provides a method. The method includes forming a resist layer on a patterned substrate; collecting first overlay data from the patterned substrate; determining an overlay compensation based on mapping of second overlay data from an integrated circuit (IC) pattern to the first overlay data from the patterned substrate; performing a compensation process to a lithography system according to the overlay compensation; and thereafter performing a lithography exposing process to the resist layer by the lithography system, thereby imaging the IC pattern to the resist layer.

Lithography process and system with enhanced overlay quality

Growing community of inventors

Hsin-Chu, Taiwan

Ming-Sen Tung