Asm America, Inc.

Min Yan

Eric James Shero

Carl Louis White

Mohith E Verghese

Herbert Terhorst

Kyle Fondurulia

Marko Peussa

Darko Babic

An atomic deposition (ALD) thin film deposition apparatus includes a deposition chamber configured to deposit a thin film on a wafer mounted within a space defined therein. The deposition chamber comprises a gas inlet that is in communication with the space. A gas system is configured to deliver gas to the gas inlet of the deposition chamber. At least a portion of the gas system is positioned above the deposition chamber. The gas system includes a mixer configured to mix a plurality of gas streams. A transfer member is in fluid communication with the mixer and the gas inlet. The transfer member comprising a pair of horizontally divergent walls configured to spread the gas in a horizontal direction before entering the gas inlet.

Reaction system for growing a thin film

Growing community of inventors

Nieuwegein, Netherlands

Min Yan