Cj Cheiljedang Corporation

Samsung Electronics Co., Ltd.

Cj Wellcare Corporation

Min Ju Park

Seung Won Park

Seong Jun Cho

Young Ho Hong

Taek Beom Kim

Kyung Il Kang

Bi Na Kim

Song Hui Gwon

Hyunwoo Kim

Su Jin Kim

Sang Bum Lee

Su-Min Park

Sung Hee Park

Hyojin Yun

So-Ra Han

Sung Wook Han

Kyoungseon Kim

Jae Ho Jang

Su Jin Heo

Ah Jin Kim

Haisub Na

Tae Joo Yang

Disclosed are a novel strain of, a method of producing fermented grains using the strain, fermented grains produced using the strain, and a composition for thrombolysis; digestion improvement; prophylaxis, amelioration or treatment of bowel inflammation, serous membrane weakening or intestinal injury; or antioxidation, comprising the fermented grains.

Strain derived from traditional fermented food and having excellent enzyme productivity, and method for preparing fermented cereal enzyme food by using same

The present invention relates to aK2G strain, which is excellent in removal of anti-nutritional factors and in protease activity, and shows excellent antimicrobial activity against pathogens and reduced productivity of viscous substances, a method for producing a fermented soybean meal using the strain, a fermented soybean meal produced therefrom, and a feed composition including the same. The fermented soybean meal prepared byK2G strain according to the present invention has few anti-nutritional factors such as trypsin inhibitors, soybean oligosaccharides, and polysaccharides, a high content of crude proteins, and high protein solubility, and also consists of small-sized peptides digestible by livestock due to low-molecularization, thereby being effectively used as a high-quality vegetable protein feed having excellent absorption rate and feed efficiency.

sp. strain with improved productivity of fermented soybean meal and method for producing fermented soybean meal using the same

Provided is a method of fabricating a semiconductor device. The method includes forming an anti-reflection layer on a lower layer, forming photoresist patterns on the anti-reflection layer, forming protection patterns to cover the photoresist patterns, respectively, etching the anti-reflection layer using the photoresist patterns covered with the protection patterns as an etch mask to form anti-reflection patterns, forming spacers to cover sidewalls of the anti-reflection patterns, and removing the anti-reflection patterns.

Method of forming fine patterns in an anti-reflection layer for use as a patterning hard mask

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Seoul, South Korea

Min Ju Park