Sinfonia Technology Co., Ltd.

Mikio Segawa

Yasushi Taniyama

Mitsuo Natsume

Atsushi Suzuki

Toshihiro Kawai

Kunihiko Sato

Shin Kawahisa

An EFEM includes a housingthat constitutes a wafer transport chamberthat is substantially closed by connecting load portsto an openingprovided on a wall, and connecting a processing apparatus; a wafer transport apparatus, and transports a wafer between the processing apparatusand the FOUPsmounted on the load ports; a gas delivery port; a gas suction port; a gas feedback path; and a FFUthat includes a filterthat is provided in the gas delivery port, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamberis circulated by generating a downward gasflow in the wafer transport chamberand feeding back the gas through the gas feedback path

EFEM

The present invention provides an atmosphere replacement apparatus capable of replacing the atmosphere on the surface of a wafer with a small amount of gas. The apparatus is configured to have a cover capable of facing and covering the wafer to be transported, and a gas supply means that supplies gas having properties different from a surrounding atmosphere from the cover, and replaces the atmosphere on the surface of the wafer by the gas.

Atmosphere replacement apparatus, substrate transport apparatus, substrate transport system, and EFEM

Growing community of inventors

Tokyo, Japan

Mikio Segawa