Carl-Zeiss-Smt Ag

Michael Mühlbeyer

Johannes Lippert

Hubert Holderer

Bernhard Gellrich

Yim-Bun Patrick Kwan

Udo Dinger

Ulrich Weber

Stefan Xalter

Alexander Kohl

Franz Sorg

Hans-Jürgen Mann

Frank Melzer

Wolfgang Hummel

Jochen Weber

Thomas Ittner

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Raoul Reiner

Markus Neumaier

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure machine

An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterized in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.

Device consisting of at least one optical element

There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment of a ring field, in which the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry and the extension is at leastmm. The objective comprises a first (S), a second (S), a third (S), a fourth (S), a fifth (S) and a sixth mirror (S) in centered arrangement relative to an optical axis. Each of these mirrors have an off-axis segment, in which the light beams traveling through the projection objective impinge. The diameter of the off-axis segment of the first, second, third, fourth, fifth and sixth mirrors as a function of the numerical aperture NA of the objective at the exit pupil is &#x2266;1200 mm * NA.

6-mirror microlithography projection objective

In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

Optical element deformation system

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Aalen, Germany

Michael Mühlbeyer