Applied Materials, Inc.

Michael J DeChellis

Mark A Crockett

John William Lane

Balarabe Mohammed

Chris Melcer

Aneesh Khullar

Erica Porras

A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.

Manufacture of an integrated fluid delivery system for semiconductor processing apparatus

The disclosure pertains to a compact integrated fluid control valve useful in controlling process fluids handled as part of a semiconductor processing operation. In the wetted section of the valve, process fluids enter through one or more entrance ports and exit through an annular metallic valve seat. In the valve's drive section, a sliding cylinder, including an upper horizontal member tied to a lower horizontal member, moves up and down. The lower horizontal member presses a diaphragm against the valve seat to close the valve, and moves away from the valve seat to permit fluid flow through the valve. A spring presses at the top of the upper horizontal member of the sliding cylinder, while a controlled pneumatic pressure is applied at the bottom of the upper horizontal member. The balance between the force of the spring and the force of the pneumatic pressure determines the extent to which the valve is open.

Diaphragm valve with dynamic metal seat and coned disk springs

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Austin, TX, United States of America

Michael J DeChellis