Carl Zeiss Smt Gmbh

Michael Erath

Jens Prochnau

Marwène Nefzi

Ralf Zweering

Jasper Wesselingh

Viktor Kulitzki

Bernhard Gellrich

Florian Bach

Ulrich Schoenhoff

Steffen Fritzsche

Norbert Muehlberger

Axel Lorenz

Hendrik Wagner

Alexander Vogler

Stefan Troeger

Stefan Schaff

Florian Ahles

Rodolfo Rabe

Florian Herold

Charles Seviour

Dirk Eicher

Philipp Gaida

Ansgar Holle

A projection exposure apparatus has a vibration damper with a holder and a mass that is connected to the holder via a damping element. The vibration damper comprises a temperature control device for the temperature control of the damping element. The disclosure also relates to a method for designing a vibration damper.

Projection exposure apparatus for semiconductor lithography with a vibration damper and method for designing a vibration damper

A weight compensating device includes a stator and a translator. The translator is movable relative to the stator along a movement axis. The translator includes a first permanent magnet arrangement with an axial magnetization. The stator includes a second permanent magnet arrangement radially surrounding the first permanent magnet arrangement. The stator includes a third permanent magnet arrangement that is coaxially below the first permanent magnet arrangement and that has an axial magnetization aligned in inverse fashion with respect to the axial magnetization of the first permanent magnet arrangement. The stator includes a magnetic body arrangement that is coaxially above the first permanent magnet arrangement. The first permanent magnet arrangement, the second permanent magnet arrangement, the third permanent magnet arrangement and the magnetic body arrangement form a magnetic unit and, in interaction with one another, form a compensating force that counteracts the weight acting on the translator.

Weight-force compensation device

An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

Optical arrangement, in particular lithography system

An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

Optical arrangement, in particular lithography system, with a transport lock

The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Assembly in a microlithographic projection exposure apparatus

The disclosure provides a device for aligning a component via a guide member. A head region of the guide member is secured at a fixing point of the component, and a foot region of the guide member is secured at a fixing point of an actuating element of an actuating facility. The actuating facility is configured to hold the guide member moveably in a movement axis for the purpose of transmitting a force to the component. An adjusting facility is provided to adjust the fixing point of the actuating element so that an angle between the movement axis and the course of the guide member between the fixing points is variable.

Device for aligning a component

The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.

Arrangement for mounting an optical element

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Dietenheim, Germany

Michael Erath