Accretech USA, Inc.

Michael D Robbins

Satish Sadam

Paul Forderhase

Siming Lin

Ju Jin

Vishal Verma

Zhiyan Huang

A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.

Automatic wafer edge inspection and review system

An apparatus for shaping and encapsulating near edge regions of a semiconductor wafer is described. A housing of the apparatus has a slot for receiving an edge of a wafer affixed on a rotatable chuck. At least one plasma source connected to the housing generates a flow of reactive gas towards the edge of the wafer. A channel in the housing directs a flow of diluent/quenching gas onto the wafer in close proximity to an exhaust channel for exhausting of the diluent/quenching gas and the reactive gas away from the wafer. The apparatus may also provide a plurality of plasma sources, for example, plasma sources for selectively etching of a polymer on the wafer, etching of silcon dioxide on the wafer and depositing an encapsulating silicon dioxide layer on the wafer.

Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates

Growing community of inventors

Round Rock, TX, United States of America

Michael D Robbins