Nanophotonics Ag

Other

International Business Machines Corporation

Infineon Technologies Ag

Recif Sa

Imm, Institut Fur Mikrotechnik Gmbh

Nanophotonics Ab

Michael Abraham

Matthias Eberhardt

Alain Gaudon

Pierre Astegno

Thomas Zetterer

Ivo J M M Raaijmakers

Wolfgang Ehrfeld

Eckhard Marx

Manfred Lacher

Andreas Lang

Peter Pokrowsky

Michael Schweiger

Eckehard Kiefer

Oliver Depner

Alexander Ruf

Thomas R Dietrich

Matthias Hampel

Bernd Stenkamp

A substrate measurement system including a measurement chamber and a substrate handling chamber possessing a substrate transfer and a substrate container interface arranged to receive a substrate to container. The handling chamber contains a first interface to connect the measurement chamber and the measurement chamber contains a second interface to connect the handling chamber. The transfer means is arranged to transfer substrates between the container and the measurement chamber through the handling chamber, in which system a second measurement chamber is provided, having the same second interface as the first measurement chamber to replace latter chamber.

Modular substrate measurement system

In view of the miniaturization of semiconductor components, the prevention of particles and other defects on the wafer surface during production is of great importance. The inspection should proceed as process-oriented as possible. For this purpose, devices are needed which on the one hand, are of very compact construction, while on the other hand, they still are equipped with measuring systems meeting the highest requirements. The device according to the invention for measuring surface defects, comprising a sample holder, a rotation drive for the sample holder, wherein the rotational axis runs perpendicular to the sample surface to be measured, an optical measuring system () for measuring scattered light, as well as at least one linear drive () for the measuring system, wherein the rotational direction is radial to the rotational axis of the sample holder, is capable of scanning the entire sample surface (). By moving not only the sample, but also the measuring system, the need for space as a whole is reduced and the total device can be constructed with a more compact design.

Device for measuring surface defects

A measurement device, i.e. a metrology tool, and a vehicle are combined to provide a mobile metrology in a fabrication facility. Peripheral equipment such as a device transfer unit, for, e.g., FOUPs in semiconductor manufacturing, an electronic control system with, e.g., a PC, monitor, and keyboard and optionally a vacuum pump is also provided in module frames of the vehicle. The measurement configuration particularly reduces bottleneck situations in equipment qualifying of processing tools during fast ramp-up phases of, e.g., semiconductor manufacturing facilities, thereby saving costs. The construction is based on PGVs or AGVs and allows a fast operation directly at the location of a processing tool. With the possible exception of power supply or operator control, the measurement configuration can operate fully autonomously.

Measurement configuration including a vehicle and method for performing measurements with the measurement configuration at various locations

A measurement box which can be integrated into existing wafer processing equipment. The measurement box comprises an enclosure which contains a measurement module for measuring objects such as the surfaces of wafers. The measurement module is equipped with a miniaturized measuring device and has a displaceable measuring head and a plane table with a rotatable wafer holder. The enclosure has at least one loading opening for the wafer to pass through as well as a ventilation device.

Measurement box with module for measuring wafer characteristics

The present invention relates to a measuring module, whose measuring device comprises a measuring head equipped with a miniaturized measuring unit, and a spatially separately arranged control and evaluation unit, and wherein the measuring head is arranged so as to be able to slide linearly by means of a sliding drive.

Measuring module

To carry out measurements in the vacuum, for example for quality control in the production of semiconductors, conventional stand alone measuring machines are installed. They are very cost, space and time intensive. To enable a process oriented measurement under optimal conditions, a device with a two part case is proposed that can be moved in a vacuum chamber, whereby one part of the case projects into the vacuum chamber and the other part of the case is located outside the vacuum chamber. The case can receive a measurement system. In addition, an adjusting device, engaging with the case, and a counterpull device, engaging with the second part of the case, are provided.

Vacuum measurement device

Substrate measurement system including a measurement chamber ( ), and a substrate handling chamber ( ) possessing substrate transfer means ( ) and a substrate container interface ( ) arranged to receive a substrate container ( ), the handling chamber ( ) containing an interface ( ) to connect the measurement chamber ( ), the measurement chamber ( ) containing an interface ( ) to connect to the handling chamber ( ), and the transfer means ( ) being arranged to transfer substrates between the container ( ) and the measurement chamber ( ) through the handling chamber ( ), in which a second measurement chamber ( ) is provided, having the same interface ( ) as the first measurement chamber ( ) to replace the latter chamber ( ).

A micropolarimeter and ellipsometer for obtaining complete optical information of superficially illuminated specimens. A compact construction is designed to facilitate their use. To obtain the simultaneous surface measurement of all optical information from a specimen, the retarder of the micropolarimeter consists of a one-piece retarder array with at least one pixel group, in which the major axis orientations of the individual pixels are distributed over an angular range of 360&deg;. This micropolarimeter can be integrated into the reflected light microscope of an ellipsometer. The result is a compact measurement unit.

Micropolarimeter and ellipsometer

The invention concerns a micropolarimeter comprising an analyzer (,) and a detector (,) located past the analyzer in the direction of radiation and presenting a number of segments N,which is higher than or equal to 3 (,). The invention seeks to provide a micropolarimeter with no moving parts, with a high polarization index, for use for polychromatic light, so small that it can detect the ray of common lasers in one single measurement step without it being necessary to enlarge it, and capable of being converted in a simple manner into a complete Stokesmeter. To that end, the analyzer (,) consists of a radially symmetrical flat disk (,) produced in a polarizing material with which the polarization rests on absorption effects inside said material, the surface of the analyzer (,) being greater than or equal to the surface of the detector segments (,)

Micropolarimeter

Normally, repeated calibration measurements are necessary for the adjustment of the sample and ellipsometer. To achieve an automatic relative adjustment, a sample position detection system that can be adjusted in relation to the ellipsometer and locked in is assigned to the ellipsometer, and where the detection system is connected to an adjusting system that affects the sample table and/or the entire system detection system/ellipsometer. The method for automatic relative adjustment is provided for, that by initially using one sample, the system sample/ellipsometer is adjusted via the symmetry of the detector signal of the ellipsometer, and that the sample position detection system is adjusted and subsequently locked in with the ellipsometer. With all subsequent samples, a relative adjustment of sample and ellipsometer detection system is performed using the signals of the detection system. In particular, the measurements can be performed without moving the sample itself because the adjustment can also be carried out through a single movement of the ellipsometer detection system.

Method and device for automatic relative adjustment of samples in

A micropolarimeter comprises an analyzer (1) and a detector (3), which is typically a photodetector array. The detector has a circular configuration of a number N of sectors. Analyzer (1) and detector (3) form a unit with the analyzer assigning different polarization values to the sectors. Analyzer and the detector contain no moving parts. Three different embodiments are proposed for the analyzer: a glass cone, covered with a polarizing thin film stack, a metal grid polarizing array, and an array of polarizing waveguides. The micropolarimeter (14) is used preferably in a microellipsometer system which can serve as a tool for film diagnostics, especially optical characterization of thin films.

Micropolarimeter, microsensor system and method of characterizing thin

A sensor head (1) is described, which has a spacer (5b) between a carrier element (2) and the spring arm (7), which, perhaps carries a sensor tip (9) at the free end; the spacer defines the distance d between the spring arm (7) and the carrier element (2). In a preferred embodiment, the spacer (5b) comprises a sacrificial layer (5a), which is etched out, except for the spacer (5b), after the formation of a corresponding layer system between the spring arm (7) and the carrier element (2). The carrier element (2) and the spring arm (7) are each provided with a reflecting layer (4 and 6). In accordance with another specific embodiment, plasmonactive layers can also be provided.

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Mainz, Germany

Michael Abraham