International Business Machines Corporation

University of California

Matthew A Thompson

Scott Daniel Hector

John S Taylor

Alan R Stivers

Alexander L Flamholz

Robert P Rippstein

Pawitter J S Mangat

Jerome Paul Silverman

Patrick G Kofron

William Man-Wai Tong

A process for creating a mask substrate involving depositing: 1) a coating on one or both sides of a low thermal expansion material EUVL mask substrate to improve defect inspection, surface finishing, and defect levels; and 2) a high dielectric coating, on the backside to facilitate electrostatic chucking and to correct for any bowing caused by the stress imbalance imparted by either other deposited coatings or the multilayer coating of the mask substrate. An film, such as TaSi, may be deposited on the front side and/or back of the low thermal expansion material before the material coating to balance the stress. The low thermal expansion material with a silicon overlayer and a silicon and/or other conductive underlayer enables improved defect inspection and stress balancing.

Coatings on reflective mask substrates

A x-ray scanning method involves the stops of directing an x-ray beam at a collimating first mirror having the capability of altering the source to mirror location and/or grazing angle of incidence. The beam is then reflected from a flat second mirror capable of a scanning motion by linear translation with an optional accompanying angular change in the grazing angle of incidence of the beam on the second mirror.

X-ray beam scanning method for producing low distortion or constant

Growing community of inventors

Austin, TX, United States of America

Matthew A Thompson