Jeol Ltd.

Masaru Takakura

Naoki Kato

Norihisa Mori

Shinya Fujita

Shigeru Honda

Shuichi Sakamoto

A scatter diagram display device includes a principal component analysis section that performs principal component analysis on intensity or concentration map data that represents each element, a priority level setting section that sets a priority level to each element based on the results of the principal component analysis performed by the principal component analysis section, and a display control section that performs a control process that arranges a plurality of scatter diagrams generated by combining each element based on the priority level that has been set to each element by the priority level setting section, and displays the plurality of scatter diagrams on a display section.

Scatter diagram display device and surface analyzer

A phase analyzer includes a principal component analysis section that performs principal component analysis on elemental map data that represents an intensity or concentration distribution corresponding to each element to calculate a principal component score corresponding to each unit area of the elemental map data, a scatter diagram generation section that plots the calculated principal component score to generate a scatter diagram of the principal component score, a peak position detection section that detects a peak position from the scatter diagram, a clustering section that calculates a distance between each point and each peak position within the scatter diagram, and classifies each point within the scatter diagram into a plurality of groups based on the distance, and a phase map generation section that generates a phase map based on classification results of the clustering section.

Phase analyzer, phase analysis method, and surface analyzer

A particle analysis instrument is offered which can make a measurement in a shorter time than heretofore. The particle analysis instrument () is used to analyze a sample (S) containing plural particles by measuring the sample over plural fields of view. The instrument () includes a measuring section () for scanning primary rays (EB) over the sample (S) and detecting a signal emanating from the sample (S), a particle area totalizing portion () for finding the area of particles for each field of view from the results of the measurement made by the measuring section () and summing up such areas of particles for all of the fields of view to find a total area of particles, and a decision portion () for making a decision as to whether the measurement process should be ended, based on the ratio of the total area of particles to an area of the sample (S) measured to obtain the total area of particles.

Particle analysis instrument and computer program

Method and apparatus for performing sample analysis using both the WDS and an energy-dispersive X-ray spectrometer (EDS). The analysis starts with irradiating the sample with an electron beam. Characteristic X-rays emanating from the sample are spectrally dispersed and detected by the WDS. The intensities of the characteristic X-rays at positions where the characteristic X-ray peaks are detected are measured. At this time, the background intensities of the characteristic X-rays at the positions where the characteristic X-ray peaks are detected are found based on a mean atomic number calculated using values which are derived by quantitative analysis based on the characteristic X-ray intensities measured by the EDS at the corresponding analysis positions on the sample. The background intensities are subtracted from the peak intensities at the positions where the characteristic X-ray peaks are detected by the WDS. Thus, the net characteristic X-ray intensities are found.

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Tokyo, Japan

Masaru Takakura