Mitsubishi Denki Kabushiki Kaisha

Nisshin Denki Kaushiki Kaisha

Masao Naitou

Shigeo Sasaki

Kazuhiro Shono

Tetsuya Nakanishi

Kazuhiko Noguchi

Masayasu Tanjo

Naomitsu Fujishita

Susumu Katoh

An ion implantation apparatus includes an ion source having an arc chamber generating ions and a drawing electrode drawing ions from the arc chamber, a mass separator transporting only ions desired for implantation, an ion implantation chamber in which the material to be implanted by ions is placed, and a controller means for automatically controlling the distance between the arc chamber and the drawing electrode incrementally in accordance with a theoretical calculation using normalized perveance considering the kind of ions to be implanted, the accelerating voltage, and the ion current and current density distribution.

Ion implantation apparatus

Growing community of inventors

Kyoto, Japan

Masao Naitou