Ontrak Systems, Inc.

Applied Materials, Inc.

Oktrak Systems, Inc.

Martin J McGrath

David L Thrasher

Mark A Simmons

Lynn S Ryle

Robert M Ruppell

Andrew G Weinberg

Simon Shmookler

A control system. An apparatus having a motor; a host processor for generating a message containing motor control information; a control board for receiving the message and for transmitting a command, corresponding to the message, to the motor; and a communications medium coupling the host processor and the control board. The communications medium supports a first communications path and a second communications path. The first communications path is for transmitting messages from the host processor to the control board. The second communications path is for transmitting messages from the control board to the host processor.

Scrubber control system

An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels are provided between modules to prevent leakage between the modules. A substrate transport mechanism which is moveable along a rail is provided with the stabilizer to provide for stable substrate transfer. The processing system has two brush stations which are placed within a single enclosure. The sensors located throughout the system, which sense the presence of a wafer, are fixedly mounted in a frame so that they are self-aligned to one another. In the sender station, two sensors are used, with the system requiring both sensors to sense the presence of a wafer to increase the reliability. In the dry station, the heating lamp is shielded from the substrate to reduce particulate contamination. Various flow meters are mounted on a transparent panel to provide easy and convenient hook-up. The system is provided with an airflow control bulkhead between the clean and dirty side of the system to prevent intermixing to thereby provide for lower contamination levels in the clean side of the system.

Method and apparatus for detecting a substrate in a substrate processing

An improved position control means for robotic handling systems; particularly, a system and method for determining the centerpoint of a moving object, such as a semiconductor wafer, and calibration of the object support, using an array of sensors positioned generally transverse to the arcuate path of movement of the object and its support to detect the relative positions of the object and the support to a selected destination point for the purpose of precisely positioning the object relative to the selected destination point.

System and method for automated positioning of a substrate in a

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Sunnyvale, CA, United States of America

Martin J McGrath