Intel Corporation

Tahoe Research, Ltd.

Google Inc.

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Marko Radosavljevic

Han Wui Then

Sansaptak W Dasgupta

Ravi Pillarisetty

Robert S Chau

Jack T Kavalieros

Gilbert W Dewey

Benjamin Chu-Kung

Niloy Mukherjee

Willy Rachmady

Matthew V Metz

Seung Hoon Sung

Paul B Fischer

Sanaz Kabehie Gardner

Van H Le

Walid M Hafez

Mantu K Hudait

Niti Goel

Uday Shah

Suman Datta

Brian S Doyle

Rahul Ramaswamy

Nidhi Nidhi

Nicole K Thomas

Johann Christian Rode

Justin K Brask

Amlan Majumdar

Titash Rakshit

Mark L Doczy

Prashant Majhi

Been-Yih Jin

Bruce A Block

Cheng-Ying Huang

Roza Kotlyar

Rafael Rios

Valluri Ramana Rao

Jessica S Kachian

Nancy M Zelick

Patrick R Morrow

Harald Gossner

Peter Baumgartner

Peter G Tolchinsky

Stephan Leuschner

Glenn A Glass

Stephen M Cea

Ehren Mannebach

Domagoj Siprak

Uwe Hodel

Tahir Ghani

Anand S Murthy

Johanna M Swan

Ian A Young

Kevin Lai Lin

Charles C Kuo

Scott Bruce Clendenning

Abhishek A Sharma

Robert L Sankman

Kelin J Kuhn

Harold W Kennel

Kimin Jun

Christopher J Jezewski

Leonard P Guler

Wilman Tsai

Cory E Weber

Ashish Agrawal

Ibrahim Ban

Satyarth Suri

Urusa Alaan

Michael Harper

Adel A Elsherbini

Tanay Gosavi

Dmitri E Nikonov

James S Clarke

Uygar E Avci

Elijah V Karpov

Sean T Ma

Jeanette M Roberts

Hui Jae Yoo

Hubert C George

David J Michalak

Chandra S Mohapatra

Richard E Schenker

Chia-Ching Lin

James M Blackwell

Wilfred Gomes

Zdravko Boos

Shriram Shivaraman

Zachary R Yoscovits

Roman Caudillo

Anh Phan

Lester Lampert

Ashish Verma Penumatcha

Kanwaljit Singh

Tristan A Tronic

James M Powers

Gregory W Chance

Raseong Kim

Sudipto Naskar

Beomseok Choi

Loren A Chow

An integrated circuit structure having a stacked transistor architecture includes a first semiconductor body (e.g., set of one or more nanoribbons) and a second semiconductor body (e.g., set of one or more nanoribbons) above the first semiconductor body. The first and second semiconductor bodies are part of the same fin structure. The distance between an upper surface of the first semiconductor body and a lower surface of the second semiconductor body is 60 nm or less. A first gate structure is on the first semiconductor body, and a second gate structure is on the second semiconductor body. An isolation structure that includes a dielectric material is between the first and second gate structures, and on the first gate structure. In addition, at least a portion of the second gate structure is on a central portion of the isolation structure and between first and second end portions of the isolation structure.

Gate-to-gate isolation for stacked transistor architecture via non-selective dielectric deposition structure

Embodiments disclosed herein include semiconductor devices and methods of making such devices. In an embodiment, the semiconductor device comprises a plurality of stacked semiconductor channels comprising first semiconductor channels and second semiconductor channels over the first semiconductor channels. In an embodiment a spacing is between the first semiconductor channels and the second semiconductor channels. The semiconductor device further comprises a gate dielectric surrounding individual ones of the semiconductor channels of the plurality of stacked semiconductor channels. In an embodiment, a first workfunction metal surrounds the first semiconductor channels, and a second workfunction metal surrounds the second semiconductor channels.

Plug and recess process for dual metal gate on stacked nanoribbon devices

Co-integrated gallium nitride (GaN) complementary metal oxide semiconductor (CMOS) integrated circuit technology is described. In an example, a semiconductor structure includes a silicon (111) substrate having a first region and a second region. A structure including gallium and nitrogen is on the first region of the silicon (111) substrate, the structure including gallium and nitrogen having a top surface. A structure including germanium is on the second region of the silicon (111) substrate, the structure including germanium having a top surface co-planar with the top surface of the structure including gallium and nitrogen. A dielectric spacer is laterally between and in contact with the structure including gallium and nitrogen and the structure including germanium, the dielectric spacer on the silicon (111) substrate.

Co-integrated gallium nitride (GaN) and complementary metal oxide semiconductor (CMOS) integrated circuit technology

Techniques are disclosed for transistor gate trench engineering to decrease capacitance and resistance. Sidewall spacers, sometimes referred to as gate spacers, or more generally, spacers, may be formed on either side of a transistor gate to help lower the gate-source/drain capacitance. Such spacers can define a gate trench after dummy gate materials are removed from between the spacers to form the gate trench region during a replacement gate process, for example. In some cases, to reduce resistance inside the gate trench region, techniques can be performed to form a multilayer gate or gate electrode, where the multilayer gate includes a first metal and a second metal above the first metal, where the second metal includes lower electrical resistivity properties than the first metal. In some cases, to reduce capacitance inside a transistor gate trench, techniques can be performed to form low-k dielectric material on the gate trench sidewalls.

Transistor gate trench engineering to decrease capacitance and resistance

A pbit device, in one embodiment, includes a first field-effect transistor (FET) that includes a source region, a drain region, a source electrode on the source region, a drain electrode on the drain region, a channel region between the source and drain regions, a dielectric layer on a surface over the channel region, an electrode layer above the dielectric layer, and a ferroelectric (FE) material layer between the dielectric layer and the electrode layer. The pbit device also includes a second FET comprising a source electrode, a drain electrode, and a gate electrode. The drain electrode of the second FET is connected to the drain electrode of the first FET.

Probabilistic computing devices based on stochastic switching in a ferroelectric field-effect transistor

Disclosed herein are IC devices, packages, and device assemblies that include III-N diodes with n-doped wells and capping layers. An example IC device includes a support structure and a III-N layer, provided over a portion of the support structure, the III-N layer including an n-doped well of a III-N semiconductor material having n-type dopants with a dopant concentration of at least 5×10dopants per cubic centimeter. The IC device further includes a first and a second electrodes and at least one capping layer. The first electrode interfaces a first portion of the n-doped well. The capping layer interfaces a second portion of the n-doped well and includes a semiconductor material with a dopant concentration below 10dopants per cubic centimeter. The second electrode is provided so that the capping layer is between the second portion of the n-doped well and the second electrode.

III-N diodes with n-doped wells and capping layers

High voltage metal insulator metal capacitors are described. In an example, a capacitor includes a first electrode plate, and a first capacitor dielectric on the first electrode plate. A second electrode plate is on the first capacitor dielectric and is over and parallel with the first electrode plate, and a second capacitor dielectric is on the second electrode plate. A third electrode plate is on the second capacitor dielectric and is over and parallel with the second electrode plate, and a third capacitor dielectric is on the third electrode plate. A fourth electrode plate is on the third capacitor dielectric and is over and parallel with the third electrode plate. In another example, a capacitor includes a first electrode, a capacitor dielectric on the first electrode, and a second electrode on the capacitor dielectric. The capacitor dielectric includes a plurality of alternating first dielectric layers and second dielectric layers.

High voltage metal insulator metal (MIM) capacitor

An integrated circuit structure having a stacked transistor architecture includes a first semiconductor body (e.g., set of one or more nanoribbons) and a second semiconductor body (e.g., set of one or more nanoribbons) above the first semiconductor body. The first and second semiconductor bodies are part of the same fin structure. The distance between an upper surface of the first semiconductor body and a lower surface of the second semiconductor body is 60 nm or less. A first gate structure is on the first semiconductor body, and a second gate structure is on the second semiconductor body. An isolation structure that includes a dielectric material is between the first and second gate structures, and is on and conformal to a top surface of the first gate structure. In addition, a bottom surface of the second gate structure is on a top surface of the isolation structure, which is relatively flat.

Gate-to-gate isolation for stacked transistor architecture via selective dielectric deposition structure

Techniques are provided herein to form semiconductor devices having a stacked transistor configuration. An n-channel device and a p-channel device may both be gate-all-around (GAA) transistors each having any number of nanoribbons extending in the same direction where one device is located vertically above the other device. According to some embodiments, the n-channel device and the p-channel device conductively share the same gate, and a width of the gate structure around one device is greater than the width of the gate structure around the other device. According to some other embodiments, the n-channel device and the p-channel device each have a separate gate structure that is isolated from the other using a dielectric layer between them. A gate contact is adjacent to the upper device and contacts the gate structure of the other lower device.

Asymmetric gate structures and contacts for stacked transistors

Gallium nitride (GaN) integrated circuit technology is described. In an example, an integrated circuit structure includes a substrate including silicon, the substrate having a top surface. A first trench is in the substrate, the first trench having a first width. A second trench is in the substrate, the second trench having a second width less than the first width. A first island is in the first trench, the first island including gallium and nitrogen and having first corner facets below the top surface of the substrate. A second island is in the second trench, the second island including gallium and nitrogen and having second corner facets below the top surface of the substrate.

Gallium nitride (GaN) integrated circuit technology

An integrated circuit structure includes a substrate including silicon, the substrate having a top surface. A first trench is in the substrate, the first trench having a first width and a first height. A second trench is in the substrate, the second trench having a second width and a second height. The second width is greater than the first width, and the second height is greater than the first height. A first island is in the first trench, the first island including gallium and nitrogen and having first corner facets at least partially below the top surface of the substrate. A second island is in the second trench, the second island including gallium and nitrogen and having second corner facets at least partially below the top surface of the substrate.

Gallium nitride (GaN) selective epitaxial windows for integrated circuit technology

Gallium nitride (GaN) integrated circuit technology with optical communication is described. In an example, an integrated circuit structure includes a layer or substrate having a first region and a second region, the layer or substrate including gallium and nitrogen. A GaN-based device is in or on the first region of the layer or substrate. A CMOS-based device is over the second region of the layer or substrate. An interconnect structure is over the GaN-based device and over the CMOS-based device, the interconnect structure including conductive interconnects and vias in a dielectric layer. A photonics waveguide is over the interconnect structure, the photonics waveguide including silicon, and the photonics waveguide bonded to the dielectric layer of the interconnect structure.

Gallium nitride (GaN) integrated circuit technology with optical communication

Embodiments disclosed herein include forksheet transistor devices having a dielectric or a conductive spine. For example, an integrated circuit structure includes a dielectric spine. A first transistor device includes a first vertical stack of semiconductor channels spaced apart from a first edge of the dielectric spine. A second transistor device includes a second vertical stack of semiconductor channels spaced apart from a second edge of the dielectric spine. An N-type gate structure is on the first vertical stack of semiconductor channels, a portion of the N-type gate structure laterally between and in contact with the first edge of the dielectric spine and the first vertical stack of semiconductor channels. A P-type gate structure is on the second vertical stack of semiconductor channels, a portion of the P-type gate structure laterally between and in contact with the second edge of the dielectric spine and the second vertical stack of semiconductor channels.

Forksheet transistors with dielectric or conductive spine

Gate-all-around integrated circuit structures having depopulated channel structures, and methods of fabricating gate-all-around integrated circuit structures having depopulated channel structures using a selective bottom-up approach, are described. For example, an integrated circuit structure includes a vertical arrangement of nanowires above a substrate. The vertical arrangement of nanowires has one or more active nanowires above one or more oxide nanowires. A first gate stack is over and around the one or more active nanowires. A second gate stack is over and around the one or more oxide nanowires.

Gate-all-around integrated circuit structures having depopulated channel structures using selective bottom-up approach

Integrated circuitry comprising a ribbon or wire (RoW) transistor stack within which the transistors have different threshold voltages (V). In some examples, a gate electrode of the transistor stack may include only one workfunction metal. A metal oxide may be deposited around one or more channels of the transistor stack as a solid-state source of a metal oxide species that will diffuse toward the channel region(s). As diffused, the metal oxide may remain (e.g., as a silicate, or hafnate) in close proximity to the channel region, thereby altering the dipole properties of the gate insulator material. Different channels of a transistor stack may be exposed to differing amounts or types of the metal oxide species to provide a range of Vwithin the stack. After diffusion, the metal oxide may be stripped as sacrificial, or retained.

Ribbon or wire transistor stack with selective dipole threshold voltage shifter

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Beaverton, OR, United States of America

Marko Radosavljevic