Ultratech Stepper, Inc.

Euv Llc.

Mark E Williams

A magnetic levitation (maglev) stage apparatus and method is disclosed. The maglev stage includes a movable platen having an upper surface capable of supporting a workpiece. A set of magnet arrays is arranged on the bottom surface of the platen, and first and second side magnet arrays are arranged on opposite sides of the platen. A support frame at least partially surrounds the platen on the first and second sides and the bottom surface. A plurality of motor coils is arranged on the support frame so as to be in operable communication with the set of magnet arrays and the side magnet arrays. The magnet arrays and motor coils are operable to magnetically levitate the platen within the support frame and move the platen in up to six degrees of freedom (DOF), with all forces directed through the center-of-gravity of the platen along the DOF axes. Movable counterweights may also be employed to facilitate the smooth movement of the platen.

Magnetic levitation stage apparatus and method

A stage for precise positioning of a chuck in three orthogonal linear axes and in three orthogonal rotation axes that includes first and second subassemblies. The a first subassembly includes (i) a monolithic mirror that supports the chuck wherein the monolithic mirror has at least two polished orthogonal faces for interferometric determination of the X, Y, and &THgr;z positions; (ii) a plurality of electromagnetic actuators that control fine positioning in all six axes and coarse positioning in one axis; (iii) a position sensor for measuring the vertical Z position of the monolithic mirror; and (iv) a Lorentz actuator, that includes magnet array, for effecting motion in the Y axis. The a second subassembly comprising a stepping axis beam over which the first subassembly is suspended, wherein the stepping axis beam includes a drive coil array for the Lorentz actuator. T the stage can also include a cable stage subassembly that is positioned a fixed distance away from the monolithic mirror and/or a mechanical zero reference for the first subassembly.

Extreme-UV scanning wafer and reticle stages

An active vibration isolation and payload reaction force compensation system includes a number of isolation legs which support equipment subject to undesirable vibrations. Each leg includes an elastomeric support member which supports the mass of the equipment and attenuates seismic forces transmitted from the ground to the system. A number of force actuators fixed to each leg and to the equipment in oppositely directed pairs provide forces directed to compensate for motions of the equipment. Six accelerometers are provided on the equipment to measure accelerations in six degrees of freedom. A control system, responsive to signals from the accelerometers, causes actuation of the force actuators.

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Windham, NH, United States of America

Mark E Williams