Kla Tencor Corporation

High Yield Technology

Mark A Nokes

Peter G Borden

Henrik Nielsen

James B Stolz

Lionel Kuhlmann

Maurits Kain

George L Coad

Yung C Lee

Ron B Whitney

A linear position array detector system is provided which imparts light energy to a surface of a specimen, such as a semiconductor wafer, receives light energy from the specimen surface and monitors deviation of the retro or reflected beam from that expected to map the contours on the specimen surface. The retro beam will, with ideal optical alignment, return along the same path as the incident beam if and only if the surface is normal to the beam. The system has a measurement device or sensor within the path of the retro or reflected beam to measure deviation of the retro beam from expected. The sensor is preferably a multiple element array of detector-diodes aligned in a linear fashion. A unique weighting and summing scheme is provided which increases the mechanical dynamic range while preserving sensitivity. The system further includes a bright field Nomarski Differential Interference Contrast sensor used to split the beam into two beams and for scanning in an orientation orthogonal to the orientation of the optical lever created by the system.

Detection system for nanometer scale topographic measurements of reflective surfaces

A particle sensor which employs the principle that a particle passing through an intense laser beam will scatter light to a photodetector which then generates a measurable signal is provided. The particle sensor uses prisms and a cylindrical lens to compress the laser beam to make it very thin along the axis of particle motion but very wide in the plane perpendicular to particle motion, thereby simultaneously providing high beam intensity for enhanced sensitivity and a large detection area. The optical components of the sensor are mounted on separate sections which allows the optical components to be separately aligned and changed so that the sensor may be easily adapted to various applications.

High sensitivity, large detection area particle sensor for vacuum

A raster scan apparatus provides a scanning assembly capable of moving in a sinusoidal motion along a first direction and stepping in fine steps in a second direction perpendicular to the first direction. In one embodiment, a piezoelectric bimorph sets in scanning motion a scanning assembly formed by a wafer holder and leaf springs. The amplitude of the scanning motion is controlled by a voltage applied across the piezoelectric bimorph. A Hall effect sensor provides an output signal indicating the instantaneous location of the scanning assembly in motion. The output signal of the Hall effect sensor is compared against a predetermined threshold to provide a trigger signal for synchronization. The output signal of the Hall effect sensor is also fed back to the source of sinusoidal voltage to adaptively adjust the sinusoidal voltage so as to achieve a predetermined amplitude for the scanning motion.

Low cost stage for raster scanning of semiconductor wafers

Growing community of inventors

Palo Alto, CA, United States of America

Mark A Nokes