Tokyo Electron Limited

Tel Kyushu Limited

Mamoru Sugita

In an exposure method of the present invention, exposure light is radiated onto a peripheral portion of a substrate to be processed while the substrate is rotated, and the rotational speed of the substrate is selectively decreased when a specific peripheral portion reaches an exposure area, thereby performing predetermined exposure of the substrate. An exposure apparatus of the present invention includes a mounting table on which the substrate is mounted, a rotating mechanism for rotating the mounting table at a predetermined rotational speed, a light radiating element arranged to oppose a mounting surface of the mounting table, light amount control means for controlling the amount of light radiated from the light radiating element onto the substrate, and rotational speed control means for controlling the rotational speed of the mounting table in accordance with the radiation amount of light from the light radiating element.

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Kumamoto, Japan

Mamoru Sugita