Canon Kabushiki Kaisha

Makoto Higomura

Takao Kariya

Naoto Abe

Kenji Saitoh

Ryuichi Ebinuma

Kunitaka Ozawa

Shunichi Uzawa

Mitsuaki Amemiya

Nobutoshi Mizusawa

Eiji Sakamoto

Koichi Matsushita

Toshikazu Sakai

Kohji Uda

Hironori Yamamoto

Masaru Ohtsuka

Mahito Negishi

Shinji Ohishi

Shigeo Sakino

Yasuo Kawai

Michio Horikoshi

Shinkichi Ohkawa

Kotaro Hosaka

Motomu Furukawa

Haruyuki Kusunoki

Hiroyuki Otsuka

Toshihiko Yamaura

A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.

Alignment apparatus and SOR X-ray exposure apparatus having same

A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure. By this, a more highly integrated semiconductor device can be produced.

Alignment apparatus and SOR x-ray exposure apparatus having same

Control method and apparatus for positioning an X-ray stage which is movable in X and Y directions to move a semiconductor wafer, for example, in a stepper wherein a pattern formed in the mask is sequentially printed on the shot areas of a semiconductor wafer in a step-and-repeat manner. The X-Y stage is provided with a wafer chuck supported by means of a tilting stage to control the tilting of the wafer chuck relative to the X-Y plane. In order to detect the position of the wafer chuck in the X and Y directions, the inclination of a laser interferometer mirror provided integrally with the wafer chuck relative to the X-Y plane can be detected. By this, when a positioning error for the X-Y stage occurs due to the Abbe length, in the Z direction, between the wafer supporting surface of the wafer chuck and the point in the mirror at which the laser beam from the laser interferometer is incident and due to the pitching and rolling of the X-Y stage, the error is detected on the basis of the attitude change by the movement of the X-Y stage, and is corrected.

Stage positioning control method and apparatus

A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.

Movable stage mechanism

A device for controlling positioning of a movable object includes a system for storing therein a provisional target position for the movement of the movable object, the storing system being arranged to store therein the provisional target position by providing an offset with respect to a final target position at which the movable object is to be finally positioned, and a control unit for controlling movement of the movable object, the controlling unit being effective to move the movable object so that, at least during a particular section of the movement, the movable object aims at the provisional target position, and the controlling unit being also effective to introduce, at a predetermined timing, the final target position so that the movable object is moved while aiming at the final target position.

Device for controlling positioning of an object

A control system for a servomotor, includes a portion for producing a driving speed controlling signal to be applied to the servomotor, a portion for producing a driving amount controlling signal to be applied to the servomotor, and a signal controlling portion for controlling the state of transmission of the driving speed controlling signal and the driving amount controlling signal to the servomotor, the signal controlling portion being effective to establish a first transmission state in which at least the driving speed controlling signal can be transmitted to the servomotor with a predetermined amplification rate and a second transmission state in which the driving speed controlling signal can be transmitted to the servomotor with an amplification rate smaller than said predetermined amplification rate while the driving amount controlling signal can be transmitted to the servomotor with a predetermined amplification rate.

Control system for a servomotor

A moving mechanism for relatively moving first and second members, the mechanism comprising a first fluid discharging portion provided on the first member, for relatively supporting the second member by use of a static pressure, and a second fluid discharging portion operable to produce a static pressure that is effective to apply, to the first member, a force contributable to prevent any deformation of the first member due to the static pressure caused by the first fluid discharging portion.

Moving mechanism

An actuator made of a material having a shape memory effect includes a plurality of materials having a shape memory effect and a heat insulator member. The plurality of materials having a shape memory effect are disposed with the heat insulator member interposed therebetween, and the plurality of materials and the insulator member are joined together.

Actuator of shape memory effect material

A control system for positioning a movable member, includes a first control portion operative to move the movable member at a relatively high moving speed toward a position which is in proximity to a target stop position, the first control portion also being operative to decrease the moving speed of the movable member to a creep speed when the movable member moves from a predetermined deceleration starting position to said position in proximity to said target stop position; a second control portion operative on the movable member, after the creep speed is established, to place the movable member at said target position with a relatively high positional accuracy; a detector for detecting a positional error of the movable member with respect to reference at a time when said creep speed is established; and a third control portion for changing the deceleration starting position on the basis of detection by the detector.

Control system for positioning an object using switching from a speed

Growing community of inventors

Yokohama, Japan

Makoto Higomura