Rigaku Corporation

Rigaku Industrial Corporation

Makoto Doi

Shinya Hara

Yasujiro Yamada

Yoshiyuki Kataoka

Naoki Kawahara

Hisayuki Kohno

Shinya Kikuta

Noboru Yamashita

Kenji Kodama

Yoshiyuki Kataoaka

An exclusion module (21) is configured to calculate a coating amount of each component whose measurement element is not contained in the base layers, for each of corresponding measurement lines, on an assumption that that component solely makes up the thin film and to adopt a maximum coating amount as an initial value of the coating amount of that component; and to calculate a coating amount of each component whose measurement element is contained in the base layers, for each of corresponding measurement lines, on the basis of initial values of coating amounts of individual components whose measurement elements are not contained in the base layers, if calculation results for all the corresponding measurement lines give errors, to exclude that component from analysis targets as an unquantifiable component, and in other cases, to adopt a maximum coating amount as an initial value of the coating amount of that component.

X-ray fluorescence spectrometer

Provided are a total reflection X-ray fluorescence spectrometer and an estimation method which are capable of easily and quickly estimating whether contamination exists on a substrate through use of a machine learning device. The total reflection X-ray fluorescence spectrometer includes: a spectrum acquisition unit configured to acquire a spectrum; and a learning unit which includes an estimation unit configured to generate estimation data on an element contained in contamination on a surface of a substrate in response to input of the spectrum, and for which learning by the estimation unit has been executed based on teacher data including the spectrum for learning and data on the element contained in the contamination on the surface of the substrate which has been used to acquire the spectrum for learning and the estimation data generated when the spectrum for learning is input to the estimation unit.

Total reflection X-ray fluorescence spectrometer and estimation method

A measurement line evaluation unit (): calculates, for all of specified measurement lines, estimated measured intensities by theoretical calculation on the basis of a composition and/or a thickness specified for a thin film; changes, by a predetermined amount, only an estimated measured intensity of one measurement line, and obtains quantitative values of the composition and/or the thickness of the thin film after change of the estimated measured intensity, for each changed measurement line, by a fundamental parameter method; and estimates a quantitative error and/or determines possibility of analysis, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.

An X-ray fluorescence spectrometer for measuring the concentration of sulfur contained in a sample (S), by irradiating the sample (S) with primary X-rays from an X-ray tube (), monochromating fluorescent X-rays emitted from the sample (S) with a spectroscopic device, and detecting monochromated fluorescent X-rays with an X-ray detector. The spectrometer includes the X-ray tube () having a target with an element including chromium, an X-ray filter () disposed on a path of travel of X-rays between the X-ray tube () and the sample (S) and having a predetermined transmittance for Cr&#x2014;K&#x3b1; line from the X-ray tube () and made of a material which is an element of which absorption edges do not exist between energies of S&#x2014;K&#x3b1; line and Cr&#x2014;K&#x3b1; line, and a proportional counter () having a detector gas containing a neon gas or a helium gas.

A calculating devicefor calculating the concentration of elements contained in a samplebased on the FP method is provided. The calculating deviceis operable to assume a concentration of unmeasured elements as far as unmeasured elements, of which fluorescent X-rays are not measured, are concerned, and, also, to utilize, in place of the secondary X-rays emanating from the unmeasured elements contained in the sample, scattered X-rays of the primary X-rays at least equal in number to the number of the unmeasured elements, of which concentrations are assumed, and including scattered X-rays of different wavelengths before they are scattered from the sample.

Growing community of inventors

Takatsuki, Japan

Makoto Doi