Cadence Design Systems, Inc.

Louis K Scheffer

David Allan White

Robert C Pack

Akira Fujimura

Steven L Teig

Joel Reuben Phillips

Jeffrey Scott Salowe

David Cooke Noice

Aki Fujimura

Yoshikuni Abe

Robert C Doig

Kenji Yoshida

The present invention allows for a robust design using manufacturability models. A method, system and/or computer usable medium may be provided in an integrated circuit design to track sensitivity to a variation of process from wafer to wafer and/or fab to fab in order to assist the designers to anticipate the variations to improve the final yield of the products.

Robust design using manufacturability models

Disclosed is an improved method, system, and computer program product for preparing multiple levels of semiconductor substrates for three-dimensional IC integration. Some embodiments utilize the process and design models to check and fabricate the insulating dielectric layer (IDL) separating the first and the second film stacks on separate substrates and then prepare the surface of the IDL to receive an additional layer of semiconductor substrate for further fabrication of the chips. Yet some other embodiments further employ the design and process models to ensure the IDL and the semiconductor substrate are sufficiently flat, or are otherwise satisfactory, so the three-dimensional integrated circuits meet the reliability, manufacturability, yield, or performance requirements. Yet some other embodiments further employ design and process models to place the vias connecting the multiple film stacks.

Method, system, and computer program product for preparing multiple layers of semiconductor substrates for electronic designs

Some embodiments of the invention provide a manufacturing aware process for designing an integrated circuit ('IC') layout. The process receives a manufacturing configuration that specifies a set of manufacturing settings for a set of machines to be used to manufacture an IC based on the IC layout. The process defines a set of design rules based on the specified manufacturing configuration. The process uses the set of design rules to design the IC layout. Some embodiments of the invention provide a design aware process for manufacturing an integrated circuit ('IC'). The process receives an IC design with an associated set of design properties. The process specifies a manufacturing configuration that specifies a set of manufacturing settings for a set of machines to be used to manufacture the IC, where the specified set of manufacturing settings are based on the set of design properties. The process manufactures the IC based on the manufacturing settings.

Aware manufacturing of integrated circuits

A method for inspecting lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to inspect a mask.

Method and system for context-specific mask inspection

Some embodiments of the invention provide a process for designing and manufacturing an integrated circuit ('IC'). The process selects a wiring configuration and an illumination configuration. The process uses the selected wiring configuration to design an IC layout. The process then uses the selected illumination configuration to manufacture the IC based on the designed IC layout. Some embodiments concurrently select an optimal pair of wiring and illumination configurations. Other embodiments select an illumination configuration based on the selected wiring configuration. Yet other embodiments select a wiring configuration based on the selected illumination configuration. In some embodiments, selecting the illumination configuration entails selecting at least one stepper lens for the IC layout, where the stepper lens illuminates at least one mask for at least one particular layer of the IC layout. In some embodiments, this selection entails selecting a stepper lens for each particular layer of the IC layout. Also, in some embodiments, selecting the wiring configuration entails defining the width and/or spacing of the routes along different directions on at least one particular wiring layer of the IC layout. In some embodiments, this selection entails selecting width and/or spacing of routes along different directions on each particular layer of the IC layout.

Aware manufacturing of an integrated circuit

Some embodiments of the invention provide a method for placing circuit modules in an integrated circuit ('IC') layout. The method computes a placement metric for the IC layout. In some embodiments, computing the placement metric includes partitioning a region of the IC layout into several sub-regions by using a cut graph, where the cut graph is an approximation of a diagonal cut line. These embodiments then generate congestion-cost estimates by measuring the number of nets cut by the cut graph. In some embodiments, the cut graph is a staircase cut graph. These staircase cut graphs include several horizontal and vertical cut lines. In some embodiments, the cut graph is a cut arc.

Method and apparatus for approximating diagonal lines in placement

Methods and systems for representing the limitations of a lithographic process using a pattern library instead of, or in addition to, using design rules. The pattern library includes 'known good' patterns, which chip fabricators know from experience are successful, and 'known bad' patterns, which chip fabricators know to be unsuccessful. The pattern library can be used to contain exceptions to specified design rules, or to replace the design rules completely. In some implementations, the pattern library contains statistical information that is used to contribute to an overall figure of merit for the design. In other implementations, a routing tool may generate a plurality of possible IC layouts, and select one IC layout based on information contained in the pattern library.

Method and system for incorporation of patterns and design rule checking

A mechanism to compress manufacturing awareness into a small representation and to enable the router to consult the representation without performing, or understanding, detailed process analysis, is disclosed.

Method and system for representing manufacturing and lithography information for IC routing

Methods and systems for allowing an Integrated Circuit designer to specify one or more design rules, and to determine the expected probability of success of the IC design based on the design rules. Probability information is compiled for each circuit component, that specifies the probability of the circuit component working if a characteristic of the circuit component is varied. As the design rules are examined, the probability of each component working is calculated. The probabilities are combined to determine the overall probability of success for the IC design. Furthermore, the IC design may be broken into a plurality of portions, and design rules can be separately specified for each portion. This allows a designer the flexibility to use different design rules on different portions of the IC design.

System and method for statistical design rule checking

Some embodiments of the invention provide a process for designing and manufacturing an integrated circuit ('IC'). The process selects a wiring configuration and an illumination configuration. The process uses the selected wiring configuration to design an IC layout. The process then uses the selected illumination configuration to manufacture the IC based on the designed IC layout. Some embodiments select a wiring configuration based on the selected illumination configuration. In some embodiments, selecting the illumination configuration entails selecting at least one stepper lens for the IC layout, where the stepper lens illuminates at least one mask for at least one particular layer of the IC layout. Also, in some embodiments, selecting the wiring configuration entails defining the width and/or spacing of the routes along different directions on at least one particular wiring layer of the IC layout.

Manufacturing aware design and design aware manufacturing of an integrated circuit

Disclosed are an improved method, system, and computer program product for a method or system with concurrent models to more accurately determine and represent the three-dimensional design features of electronic designs. Some embodiments disclose a method or a system for determining the design feature characteristics based upon their respective three-dimensional profiles. Some other embodiments further determine whether the design objectives or constraints are met or may be relaxed based upon the design feature characteristics in order to complete the design. Other embodiments store the profile or geometric characteristics, or information derived therefrom, in a database associated with the design to reduce the need for potentially expensive computations. The method or system may modify the designs or the processes to reflect whether the design objectives or constraints are met or relaxed.

Method, system, and computer program product for determining three-dimensional feature characteristics in electronic designs

Disclosed is an improved method, system, and computer program product for predicting and improving the integrity, manufacturability, reliability, and performance of an electronic circuit feature based on the stresses or strains of design features of electronic designs. Some embodiments identify the design, the concurrent model(s), design feature physical or electrical parameters or attributes, analyzes the stresses or strains to predict the integrity of the design and determines whether the design meets the design objectives or constraints. Some other embodiments make corrections to the designs or the processes based upon the determination of whether the design meets the design objectives or constraints. Some other embodiments compute the variations of the design features as a result of the stresses or strains and determine their impact on the subsequent processes.

Growing community of inventors

Campbell, CA, United States of America

Louis K Scheffer