Rigaku Corporation

Rigaku Innovative Technologies, Inc.

Osmic, Inc.

Licai Jiang

Boris Verman

Kazuhiko Omote

Tetsuya Ozawa

Yuriy Platonov

Makoto Kambe

George A Gutman

Takeshi Osakabe

Bonglea Kim

Hideaki Takahashi

Kiyoshi Ogata

Yoshiyasu Ito

Masahiro Nonoguchi

Ryuji Matsuo

Hiroshi Motono

Ladislav Pina

Naohisa Osaka

Yoshio Iwasaki

Sei Yoshihara

Shigematsu Asano

Katsutaka Horada

Shiro Umegaki

Kazuki Ito

Tsutomu Tada

Ryotaro Yamaguchi

Akifusa Higuchi

Takao Kinefuchi

Karsten Joensen

Hajime Fujimura

Takashi Ida

Toshifumi Higuchi

Paul Ulrich Pennartz

Martin Horvarth

Jiri Marsik

Vaclav Jelinek

Michael Young

Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

Total reflection x-ray fluorescence spectrometer

In an X-ray inspection device according to the present invention, an X-ray irradiation unitincludes a first X-ray optical elementfor focusing characteristic X-rays in a vertical direction, and a second X-ray optical elementfor focusing the characteristic X-rays in a horizontal direction. The first X-ray optical elementis constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.

X-ray inspecting device, X-ray thin film inspecting method, and method for measuring rocking curve

An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

X-ray generator and x-ray analysis device

Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.

X-ray diffractometer with multilayer reflection-type monochromator

Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.

X-ray small angle optical system

An assembly for Kratky collimator is provided. The assembly may be used for a small angle x-ray camera or system requiring such filtering. The assembly may include a first block with a first working surface and a second block with a second working surface. The first and second blocks may be aligned with the first working surface pointing an opposite direction of the second working surface and the first working surface being aligned in a common plane with the second working surface. In some implementations, the first block may comprise a crystal material. In some implementations, an extension may of the first block may be configured position a beamstop.

High performance Kratky assembly

An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatusincludes a monochromatorthat focuses a divergent X-ray beam while dispersing it and a selection partthat is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal pointand by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, K&#x3b1;1 ray from K&#x3b1;2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

X-ray apparatus, method of using the same and X-ray irradiation method

The X-ray generating apparatusapplies an electron beam eonto a targetto generate X-rays x, and includes a permanent magnet lensconfigured to focus the electron beam e, a correction coilprovided on a side of the electron beam ewith respect to the permanent magnet lensand configured to correct a focus position formed by the permanent magnet lensin a traveling direction of the electron beam e, and a targetonto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam ecan be finely adjusted.

X-ray generating apparatus

A system for analyzing a sample is provided. The system includes an optical system capable of providing a one-dimensional beam and a two-dimensional beam. The system may include a beam selection device to select between providing a one-dimensional x-ray beam to the sample in a one-dimensional operation mode and a two-dimensional x-ray beam to the sample in a two-dimensional operation mode.

X-ray beam system offering 1D and 2D beams

A system for analyzing a sample is provided. The system includes a beam selection device for selecting between a one-dimensional operation mode for providing a one-dimensional x-ray beam to the sample and a two-dimensional operation mode for providing a two-dimensional x-ray beam to the sample.

Dual mode small angle scattering camera

A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.

X-ray scattering measurement device and X-ray scattering measurement method

An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.

Multiconfiguration X-ray optical system

A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Multi-beam X-ray system

A sample is supported on a flat rotary specimen stage and irradiated at an incidence angle &#x3b8; via a divergence slit with an x-ray beam emitted by an x-ray source, the diffraction beam from the sample is received via a divergence slit and the light-receiving slit by an x-ray detector placed at the position of a diffraction angle&#x3b8; to generate diffraction beam intensity data, the x-ray incidence angle &#x3b8; and diffraction angle&#x3b8; are fixed at intrinsic values on the sample, the sample is rotated within a plane at designated step angles by the flat rotary specimen stage, the diffraction beam intensity is measured by the x-ray detector in each in-plane rotation step, the variance induced by particle statistics is calculated from the calculated diffraction beam intensities, and the size of the crystallites in the sample is calculated based on the variance induced by the particle statistics.

Crystallite size analysis method and apparatus using powder X-ray diffraction

A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two-dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Q.

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Rochester Hills, MI, United States of America

Licai Jiang