Nikon Corporation

Lam Research Corporation

Leonard Kho

Derek Coon

Gaurav Keswani

Alex Poon

Anand Chandrashekar

Gang Liu

Krishna Birru

Gishun Hsu

Daishi Tanak

An exhaust system for a substrate processing system includes a radical generator configured to receive a gas mixture including halogen species and to generate halogen radicals, a first pump to pump exhaust gas from an exhaust outlet of a processing chamber, and a first valve configured to selectively fluidly connect an outlet of the radical generator to the first pump downstream from the outlet of the processing chamber.

Cleaning system for removing deposits from pump in an exhaust of a substrate processing system

Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.

Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine

Growing community of inventors

San Francisco, CA, United States of America

Leonard Kho