Boston University

Samsung Electronics Co., Ltd.

Lei Tian

Ji-Xin Cheng

Alex Matlock

JIan Zhao

Myungjun Lee

Wookrae Kim

Junho Shin

Seungbeom Park

Hao Wang

Hojun Lee

Jangwoon Sung

Jiabei Zhu

An example microscope includes a pump laser for providing a first illumination to a sample. A laser array provides a second illumination to the sample. The laser array may include a plurality of laser elements, each providing oblique illuminations to the sample. An illumination collecting source collects the first illumination and the second illumination from the sample. The illumination collecting source may capture transient 3D refractive index (RI) variations in the sample due to the first illumination and second illumination.

Bond-selective intensity diffraction tomography and uses thereof

A substrate inspection apparatus includes a light irradiator including an objective lens and a plurality of optical fibers. The objective lens is configured to irradiate light to an illumination area on a semiconductor substrate having a plurality of circuit pattern layers, the plurality of optical fibers are adjacent a periphery of the objective lens and are configured to irradiate the light to a peripheral area adjacent the illumination area. A light generator is configured to generate the light. The light generator is configured to change an irradiation angle of the light to selectively irradiate the light to one or more of the objective lens and the plurality of optical fibers. A light analyzer is configured to obtain images of the circuit pattern layers from the light reflected from the illumination area and the peripheral area. The light analyzer is configured to model each of the circuit pattern layers of the semiconductor substrate to obtain image models and to measure an overlay between the circuit pattern layers through the images and the image models.

Substrate inspection apparatus and substrate inspection method

Growing community of inventors

Newton, MA, United States of America

Lei Tian