Vistec Semiconductor Systems Gmbh

Kla-tencor Mie Gmbh

Kurt Hahn

Christof Krampe-Zadler

Lambert Danner

Albert Kreh

Henning Backhauss

Wolfgang Vollrath

Roland Hedrich

Gerhard Hoppen

Michael Hofmann

Hermann Bittner

Alexander Büttner

An apparatus () for the optical inspection of wafers is disclosed, which comprises an assembly unit () which carries optical elements () of at least one illumination path () for a bright field illumination and optical elements () of at least one illumination path () for a dark field illumination. The assembly unit () furthermore carries plural optical elements () of at least one detection path (). An imaging optical element () of the at least one illumination path () for the bright field illumination (), imaging optical elements () of the at least one illumination path for the dark field illumination, and imaging optical elements () of the at least one detection path () are designed in such a way that all illumination paths () and all detection paths () are telecentric.

Apparatus for the optical inspection of wafers

An illumination mean for the inspection of flat substrates is disclosed. The flat substrate includes an upper edge area, a lower edge area and a front area. The illumination means is formed as an annular segment and comprises an opening into which at least the edge area of the flat substrate extends. A plurality of light sources are arranged on an annular segment in a housing. Inside the housing, a reflective element is provided so that the light from the light sources does not impinge perpendicularly on the upper edge area, the lower edge area and the front area of the flat substrate.

Illumination means and inspection means having an illumination means

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Giessen, Germany

Kurt Hahn