Crestec Corporation

Ricoh Company, Ltd.

Konica-Minolta Holdings, Inc.

Kunito Hayashi

Kazuhiko Kobayashi

Takeshi Miyazaki

Kazumi Furuta

Osamu Masuda

Hiroyuki Miyata

A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample 'WP' and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample 'WP'. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.

Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure

The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation meanscalculates the start-to-end point distance L of a writing pattern (S), and number-of-scan-clocks calculating meanscalculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter(S). Count conversion meansseparates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S). Based on the equation, variable rate calculating meanscalculates an extinction ratio to determine the extinction ratio at a variable attenuator(S). ATT D/A converterspecifies the extinction ratio at the attenuatorto reduce the unit distance corresponding to the resolving power of the high-speed D/A converterso that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.

Electron-beam writing device and electron-beam writing method

Growing community of inventors

Tokyo, Japan

Kunito Hayashi