Shin-etsu Chemical Co., Ltd.

Nec Corporation

Kunihiro Ito

Toru Shirasaki

Isamu Teranishi

Kenichi Taguchi

Susumu Sakaguchi

Masaaki Iguchi

Batnyam Enkhtaivan

Provided is a technique to prevent an attribute inference attack against a federated learning model. An information processing apparatus () includes: a detection section () that detects, as an outlier, an output value which falls outside a normal range in terms of magnitude of a value among output values of a decision tree which is undergoing federated learning; and a determination section () that determines, in a case where the outlier has been detected, that the decision tree has vulnerability to an attack to infer an attribute value included in training data which has been used to train the decision tree.

Information processing apparatus and storage medium

Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to the pellicle for lithography. The pelliclefor lithography is comprised of a frame-like pellicle framehaving one open frame on one side of the pellicle frame and another open frame on another side of the pellicle frame; and a laser beam transmissive pellicle filmfor lithography, which is attached to the one side of the pellicle frame. The another open frame is capable of attaching to a photomaskand the pellicle film has a venting holehaving a hole size through which a gas moleculecan pass but not a foreign particle

Pellicle for lithography and method for manufacturing pellicle film

The invention provides a method for surface-finishing of a single crystal wafer of a ferroelectric material into a substrate plate suitable for use, for example, as a SAW filter element which is mirror-polished only on one of the surfaces, the other surface having an adequate roughness. Different from conventional methods, the inventive method comprises the successive steps of (a) slicing a single crystal boule into wafers, (b) lapping of the wafer on both surfaces to impart adequate roughness to the surfaces, (c) chemically etching the thus lapped surfaces to remove the strain produced in the preceding mechanical working, and (d) mirror-polishing one of the thus etched surfaces so that high uniformity of the thickness and greatly decreased warping of the wafer can be ensured.

Method for the preparation of a ferroelectric substrate plate

Growing community of inventors

Tokyo, Japan

Kunihiro Ito