Hitachi-high-technologies Corporation

Hitachi, Ltd.

Kotoko Urano

Tomonori Nakano

Zhaohui Cheng

Takeyoshi Ohashi

Hideyuki Kazumi

Yasunari Sohda

Hiroyuki Ito

Yoichi Ose

Naomasa Suzuki

Takeshi Kawasaki

Hideo Kashima

Momoyo Enyama

Makoto Sakakibara

Takafumi Miwa

Minseok Park

Yasuhiro Shirasaki

Hirokazu Tamaki

Noboru Moriya

Takashi Dobashi

Sayaka Kurata

Atsuko Shintani

Akiko Kagatsume

Thantip Krasienapibal

Hiroaki Baba

A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.

Measurement system and method for setting observation conditions of measurement apparatus

A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculated correction amount.

Charged particle beam device and aberration correction method for charged particle beam device

In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device () which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (), and a feedback determination device () which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.

Aberration correction method, aberration correction system, and charged particle beam apparatus

It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.

Charged particle beam device and arithmetic device

In order to realize a multiple assembled easily with high accuracy, a multipole having assembly accuracy within 10 micrometer and within several seconds of angle is achieved by fixing multipole elements by being guided by grooves provided on an inner side of a cylindrical housing to form the multipole.

Multipole and charged particle radiation apparatus using the same

Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.

Aberration corrector and charged particle beam apparatus using the same

In order to provide a multipole measurement apparatus that can easily obtain table data for an aberration corrector that corrects the aberrations in a charged particle beam apparatus, the multipole measurement apparatus, which is provided with an optical system (), a space into which an aberration corrector () is to be inserted, and a position detector (), measures the relationship between the incident position and angle of a primary charged particle beam on the aberration corrector () at a plurality of points, the irradiation position upon the position detector (), and a multipole, in a state of having a multipole field excited and in a state of not having a multipole field excited, so as to extract multipole components contained in the measurement executed in the state of having the multipole field excited.

Multipole measurement apparatus

Growing community of inventors

Tokyo, Japan

Kotoko Urano