Asml Netherlands B.v.

Klaus Martin Hummler

Igor Vladimirovich Fomenkov

Andrew David LaForge

Yue Ma

Alexander Igorevich Ershov

Dzmitry Labetski

Chunguang Xia

Christianus Wilhelmus Johannes Berendsen

Henricus Gerardus Tegenbosch

Marc Guy Langlois

Kornelis Frits Feenstra

Kerim Nadir

Maksim Loginov

Rui Miguel Duarte Rodrigues Nunes

Seyedmohammad Mojab

Alexander Shatalov

Arun Johnkadaksham

Matthias Kraushaar

Martinus Hendrikus Antonius Leenders

Johannes Hubertus Josephina Moors

Johannes Henricus Wilhelmus Jacobs

Robert Jay Rafac

Jan Steven Christiaan Westerlaken

Fei Liu

Antonius Theodorus Wilhelmus Kempen

William Peter Van Drent

Alexey Sergeevich Kuznetsov

Peter Gerardus Jonkers

Michael Anthony Purvis

Hendrikus Alphonsus Ludovicus Van Dijck

John Tom Stewart

Jeroen Hubert Rommers

Hubertus Johannes Van De Wiel

Parham Yaghoobi

Qiushi Zhu

Fernando Brizuela

Rob Carlo Wieggers

Umesh Prasad Gomes

Elena Nedanovska

Chengyuan Ding

Celal Korkmaz

Alexander Downn Kim

Marcus Adrianus Van De Kerkhof

John Tom Stewart, Iv

Daniel John William Brown

Rui Miguel Duarte Rodreigues Nunes

Kay Hoffmann

Peter Matthew Mayer

Rui Miguel Duarte Rodriges Nunes

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.

Oxygen-loss resistant top coating for optical elements

An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.

System for monitoring a plasma

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

Prolonging optical element lifetime in an EUV lithography system

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber () containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

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San Diego, CA, United States of America

Klaus Martin Hummler