Tokyo Electron Limited

Keisuke Tsugao

Junya Minamida

Tomonori Okumura

Takashi Ajishi

A substrate processing apparatus includes processing units, an exhaust path, a gas processing apparatus and a controller. Each processing unit is configured to process a substrate by using a chemical. A gas exhausted from the processing units flows through the exhaust path. The gas processing apparatus is provided in the exhaust path to remove a target component contained in the gas. The gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path. The partition plate divides the flow path into spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve the target component to the partition plate. The controller adjusts a flow rate of the dissolving liquid according to operation information indicating an operational status of the processing units.

Substrate processing apparatus and control method of substrate processing apparatus

A substrate liquid processing apparatus includes a liquid unit configured to process a liquid processing unit configured to process a substrate with multiple kinds of processing liquids, an exhaust pipe connected to the liquid processing unit, and configured to allow an exhaust gas from the liquid processing unit to flow therein, a plurality of individual exhaust pipes provided to correspond to at least one of the multiple kinds of processing liquids, and an exhaust switching unit connected to the exhaust pipe and the individual exhaust pipes, and configured to change a discharge destination of the exhaust gas flowing within the exhaust pipe to one of the individual exhaust pipes. The exhaust switching unit is positioned above the liquid processing unit.

Substrate liquid processing apparatus

Disclosed is a substrate processing apparatus including a chamber, a first measuring unit, an exhaust pipe, a regulation valve, an opening degree detection unit, a valve controller, and a clogging detection unit. The chamber accommodates therein a substrate to be processed by using a processing fluid. The first measuring unit measures an internal pressure of the chamber. An exhaust from the chamber flows through the exhaust pipe. The regulation valve regulates an exhaust volume of the exhaust pipe. The opening degree detection unit detects a valve opening degree of the regulation valve. The valve controller controls the valve opening degree of the regulation valve based on a measurement result of the first measuring unit to keep the internal pressure within a specified range. The clogging detection unit detects clogging of the exhaust pipe based on the valve opening degree detected by the opening degree detection unit.

Substrate processing apparatus and method for detecting clogging of exhaust pipe in substrate processing apparatus

A substrate liquid processing apparatus includes a liquid processing unit that processes a substrate with processing liquids, an exhaust pipe, individual exhaust pipes corresponding to at least one of the processing liquids and an exhaust switching unit. Further, the exhaust switching unit comprises an exhaust gas inlet chamber and switching mechanisms. The switching mechanisms correspond to the individual exhaust pipes, respectively, and each of the switching mechanisms includes an exhaust gas suction opening communicating with the exhaust gas inlet chamber; an outlet opening communicating with a corresponding one of the individual exhaust pipes; an exterior air suction opening; and a valve body that switches a communication state of the exhaust gas suction opening, the outlet opening and the exterior air suction opening between a state where the exhaust gas suction opening communicates with the outlet opening and a state where the exterior air suction opening communicates therewith.

Growing community of inventors

Koshi, Japan

Keisuke Tsugao