Tokyo Electron Limited

Keiji Tabuki

Yamato Tonegawa

Kazuo Yabe

Kazumasa Igarashi

A plasma processing apparatus includes: a processing container having a vertical tubular shape and an opening formed in a side wall of the processing container, the processing container configured to accommodate a plurality of substrates in multiple stages; a plasma partition wall airtightly provided on an outer wall of the processing container and configured to cover the opening and define a plasma generation space; a plasma electrode provided along the plasma partition wall; and a processing gas supplier provided outside the plasma generation space and configured to supply a plasma generation gas.

Growing community of inventors

Nirasaki, Japan

Keiji Tabuki