Renesas Technology Corp.

Keiichi Sugahara

Masakazu Taki

Minoru Hanazaki

Kenji Shintani

Toshio Komemura

Toshihiko Noguchi

Mutumi Tuda

A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.

Growing community of inventors

Hyogo, Japan

Keiichi Sugahara