Hitachi, Ltd.

Other

Keiichi Saiki

Kenji Watanabe

Maki Tanaka

Hiroyuki Shinada

Mari Nozoe

Aritoshi Sugimoto

Hiroshi Miyai

Hiroshi Morioka

Minori Noguchi

Hidetoshi Nishiyama

Takahiro Jingu

Yoshimasa Ohshima

Tetsuya Watanabe

Hisato Nakamura

Yuko Inoue

In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam to the sample board which is a sample, detecting generated secondary electrons by the detector , storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.

Method of inspecting circuit pattern and inspecting instrument

A system and method of inspecting a foreign particle or a defect on a sample are provided. Such a method comprises irradiating light to an object to be inspected; detecting reflected light or scattered light from the object to be inspected irradiated with the light; detecting a signal of the foreign particle or the defect from the detected signal; providing information related to a size of the foreign particle or the defect from the signal of the detected foreign particle or the defect; and outputting information on a display screen a distribution of the size of the foreign particle or defect with information indicating a cause of the distribution of the foreign particle or defect.

Apparatus and method of inspecting foreign particle or defect on a sample

Growing community of inventors

Hitachinaka, Japan

Keiichi Saiki